-
crossref
Aditya Sinha, Nishant Choudhary
2025-09-26T22:22:29Z
置信度 0.70
-
crossref
Shujun Ye, Kikuo Yamabe, Tetsuo Endoh
2021-07-01T19:52:28Z
置信度 0.70
-
crossref
Jae Hwa Seo, Young Jun Yoon, Jung-Hee Lee, In Man Kang
2017-08-13T03:02:26Z
置信度 0.70
-
In this paper, we study the impact of a local high- k gate insulator on the drivability and off-current of a gate-all-around (GAA) silicon-on-insulator (SOI) metal–oxide–semiconductor field-effect transistor (MOSFET). The replacement of part of the gate SiO 2 …
crossref
Yasuhisa Omura, Osanori Hayashi, Shunsuke Nakano
2010-04-20T01:57:52Z
置信度 0.70
-
crossref
Shankaranand Jha, Santosh Kumar Choudhary
2019-07-25T19:47:28Z
置信度 0.70
-
crossref
Manish Kumar Rai, Sanjeev Rai, Abhinav Gupta
2020-10-14T19:03:06Z
置信度 0.70
-
crossref
Manish Kumar Rai, Satyajeet Sahoo, Satya Sri Prabhas Routh, Satyanarayana Karumuri 等
2026-03-02T20:52:26Z
置信度 0.70
-
Abstract For some time now, the advancement of low power and high sensitivity biosensors has been the center of attention for in-situ detection and monitoring which form an integral part of portable health monitoring systems. This paper elucidates the design-o…
crossref
Sanjana Tiwari, Arya Dutt, Mayuresh Joshi, Prakhar Nigam 等
2021-07-23T17:10:39Z
置信度 0.70
-
Gate-all-around silicon nanowire transistor (SNWT) can be considered as the potential candidate for highly scaled devices. This paper mainly discusses a new process integration scheme, which features bulk substrate based, epi-free integration, self-aligned str…
crossref
Ru Huang, Runsheng Wang, Yu Tian, Jing Zhuge 等
2009-07-13T22:26:46Z
置信度 0.70
-
crossref
2024-05-09T15:50:12Z
置信度 0.70
-
crossref
2021-07-01T11:48:40Z
置信度 0.70
-
crossref
Guoyan Zhang, Aihua Dong, Nie Liu, Rui Tian 等
2015-03-17T23:14:30Z
置信度 0.70
-
crossref
Jae Hwa Seo, Young Jun Yoon, In Man Kang
2018-04-20T00:37:10Z
置信度 0.70
-
crossref
Jean-Pierre Colinge
2008-05-15T10:57:32Z
置信度 0.70
-
crossref
B. Iñiguez
2005-08-24T22:14:26Z
置信度 0.70
-
crossref
2026-03-23T16:21:30Z
置信度 0.70
-
crossref
Miaomiao Wang, Jingyun Zhang, Huimei Zhou, Richard G. Southwick 等
2019-05-24T04:11:10Z
置信度 0.70
-
crossref
Maryam Ziaei-Moayyed, Murat Okandan
2012-03-01T11:33:32Z
置信度 0.70
-
crossref
2025-09-09T01:00:11Z
置信度 0.70
-
crossref
2024-09-27T07:22:22Z
置信度 0.70
-
crossref
Geetha Amrutha Mandalapu, Rupa Kasireddy, Amandeep Singh
2026-01-19T20:51:22Z
置信度 0.70
-
Abstract In this paper we have performed scaling performance of asymmetric junctionless (JL) SOI nanowire FET at 10 nm gate length ( L G ). To study the device electrical performance various DC metrics like SS, DIBL, I ON / I OFF ratio are performed. Even at 5…
crossref
Bharath Sreenivasulu Vakkalak, Vadthiya Narendar
2021-11-01T17:06:02Z
置信度 0.70
-
The analog/RF performance of gate-all-around nanosheet field-effect transistor (GAA NSFET) with spacer dielectric engineering is investigated using three-dimensional TCAD tool. The analog/RF figures of merit of the proposed GAA NSFET, including the intrinsic g…
crossref
Lakshmana Chandana, Subba Rao Suddapalli
2026-05-11T14:06:32Z
置信度 0.70
-
crossref
Stuart Thomas
2020-12-11T17:04:57Z
置信度 0.70
-
crossref
Zhaoyi Kang, Liangliang Zhang, Runsheng Wang, Ru Huang
2009-09-03T03:13:48Z
置信度 0.70
-
Introduction All major integrated device manufacturers have introduced Gate All Around Nanosheet Field Effect Transistors (GAA NSFETs) as the next generation technology for CMOS applications. The design of GAA NSFETs is similar to Silicon-On-Insulator (SOI) te…
crossref
2025-07-22T16:37:26Z
置信度 0.70
-
crossref
Ming-Hung Han, Chun-Yen Chang, Yi-Ruei Jhan, Jia-Jiun Wu 等
2013-01-02T19:00:43Z
置信度 0.70
-
crossref
Sanjana Tiwari, Arya Dutt, Mayuresh Joshi, Prakhar Nigam 等
2021-07-05T09:02:55Z
置信度 0.70
-
Single‐gate metal‐oxide‐semiconductor field‐effect transistors (MOSFET) suffer from several basic physical and electrical limitations for further scaling in deep nanoscale domains, which are often known as short‐channel and reliability effects. The junctionles…
crossref
Ibrahim Rahmani, Hichem Ferhati, Zohir Dibi, Faycal Djeffal
2025-06-28T03:09:59Z
置信度 0.70
-
crossref
Qi Yan, Hua Shao, Junjie Li, Zhenzhen Kong 等
2023-05-01T13:26:51Z
置信度 0.70
-
crossref
Jae Hwa Seo, Young Jun Yoon, Ra Hee Kwon, Young In Jang 等
2016-03-28T21:06:26Z
置信度 0.70
-
crossref
Ryoongbin Lee, Suhyeon Kim, Sangwan Kim, Sihyun Kim 等
2018-04-06T00:22:40Z
置信度 0.70
-
Gate-All-Around Field-Effect Transistors (GAAFETs), now entering high-volume production as successors to fin field-effect transistor technology, are enabling continued scaling and enhanced performance in advanced semiconductor nodes. However, the drain-current…
crossref
Juan P. Mendez, Coleman Cariker, Michael Titze, Alex A. Belianinov 等
2025-12-09T22:42:37Z
置信度 0.70
-
crossref
Nurul Ezaila Alias, Mohammed Adamu Sule, Michael Loong Peng Tan, Afiq Hamzah 等
2020-08-14T20:51:51Z
置信度 0.70
-
crossref
Madhulika Korde, Sonal Dey, Alain Diebold, Nick Keller
2018-03-19T18:13:34Z
置信度 0.70
-
Abstract High‐quality liquid gate‐all‐around (LGAA) silicon nanowire (NW) field‐effect transistor (FET) biosensors are fabricated and studied their properties in 1 m m phosphate‐buffered saline solution with pH = 7.4 using transport and noise spectroscopy. At …
crossref
Yongqiang Zhang, Nazarii Boichuk, Denys Pustovyi, Valeriia Chekubasheva 等
2024-04-01T03:20:45Z
置信度 0.70
-
crossref
Xingqi Zou, Lei Jin, Dandan Jiang, Yu Zhang 等
2018-02-19T23:37:02Z
置信度 0.70
-
crossref
Wei-Ren Chen, Dun-Bao Ruan, Kuei-Shu Chang-Liao, Hao-Yan Wang 等
2023-07-21T17:21:52Z
置信度 0.70
-
Abstract In this paper, we have proposed a 2D analytical model for Asymmetric gate stack triple metal gate MOSFET(AGSTMGAAFET) and performed a comparative analysis with the simulation results obtained using the SILVACO 3D simulation software. Existing devices …
crossref
Arvind Ganesh, Kshitij Goel, Jaskeerat Singh Mayall, Sonam Rewari
2021-04-12T13:54:54Z
置信度 0.70
-
crossref
Hee Bum Roh, Jae Hwa Seo, Young Jun Yoon, Jin-Hyuk Bae 等
2014-11-28T16:15:10Z
置信度 0.70
-
crossref
R.K. Lawrence, J.P. Colinge, H.L. Hughes
2002-12-09T23:24:26Z
置信度 0.70
-
crossref
2014-07-26T02:25:36Z
置信度 0.70
-
crossref
Weijie Lu
2020-10-28T06:55:20Z
置信度 0.70
-
Transistors nanométriques à grille entourante sur canal vertical en silicium : fabrication, caractérisation et développement de portes logiques standards La taille des données et les exigences en matière de fonctionnalité pour l'informatique ne cessent d'augme…
crossref
Abhishek Kumar
2026-04-07T14:30:39Z
置信度 0.70
-
crossref
Zhihong Chen
2022-12-12T17:06:28Z
置信度 0.70
-
crossref
Nathan Totorica, Wei Hu, Feng Li
2023-08-14T12:48:49Z
置信度 0.70
-
This work presents a numerical simulation study of short channel effect (SCE) in new hemispherical gate-all-around (HGAA) MOS devices. These new HGAA architectures allow optimizing the gate electrostatic control of simple GAA MOS devices after rounding their c…
crossref
Francis Balestra, Gerard Ghibaudo
2026-05-20T01:23:37Z
置信度 0.70
-
crossref
Richa Gupta, Devi Dass, Rakesh Prasher, Rakesh Vaid
2013-11-27T10:52:40Z
置信度 0.70
-
crossref
Raj Sambhav, Yogesh Pratap
2025-06-11T00:20:52Z
置信度 0.70
-
crossref
Leo Raj Solay, S. Intekhab Amin, Pradeep Kumar, Sunny Anand
2021-11-11T08:02:45Z
置信度 0.70
-
crossref
Dheeraj Sharma, Santosh Kumar Vishvakarma
2013-10-29T23:20:35Z
置信度 0.70
-
crossref
Kiwon Song, Sangwoo Lim
2026-03-09T09:52:47Z
置信度 0.70
-
crossref
KaiMin Feng, HaoYan Liu, HuaiZhi Luo, Xi Zhang 等
2025-06-03T17:42:31Z
置信度 0.70
-
Abstract not Available.
crossref
Quazi D. M. Khosru, Saeed Uz Zaman Khan, Md. Shafayat Hossain, Fahim Ur Rahman 等
2020-02-27T00:29:14Z
置信度 0.70
-
Abstract The Gate‐All‐Around Field‐Effect Transistor (GAAFET) is proposed as a successor to Fin Field‐Effect Transistor (FinFET) technology to increase channel length and improve the device performance. The GAAFET features a complex multilayer structure, which…
crossref
Ziyi Hu, Junjie Li, Rui Chen, Dashan Shang 等
2024-10-11T04:39:40Z
置信度 0.70
-
crossref
Po-Jui Lin, Yung-Yueh Chiu, Frederick Chen, Riichiro Shirota
2021-02-23T20:49:35Z
置信度 0.70
-
This work demonstrates a self-consistent 2-D numerical model for calculating the charge profile and gate capacitance and therefore obtaining C-V characteristics of a gate-all-around III-V nanowire transistor with a high mobility In 0.53 Ga 0.47 As channel and …
crossref
Quazi D. M. Khosru, Saeed Uz Zaman Khan, Md. Shafayat Hossain, Fahim Ur Rahman 等
2013-05-02T22:48:31Z
置信度 0.70
-
crossref
Sung-Jin Choi, Dong-Il Moon, Sungho Kim, Jae-Hyuk Ahn 等
2011-04-15T23:56:13Z
置信度 0.70
-
crossref
Shubham Verma, Vimal Kumar Singh Yadav, Sanjeev Rai
2025-10-29T07:24:06Z
置信度 0.70
-
crossref
Y. Yue, J.J. Liou, I. Batarseh
2002-12-23T23:08:12Z
置信度 0.70
-
crossref
Young Jae Kim, Young Jun Yoon, Jae Hwa Seo, Sung Min Lee 等
2014-11-28T17:40:59Z
置信度 0.70
-
crossref
Dong Seup LEE, Hong-Seon YANG, Kwon-Chil KANG, Joung-Eob LEE 等
2010-05-06T06:03:15Z
置信度 0.70
-
crossref
Amir Hossein Bayani, Daryoosh Dideban, Mojtaba Akbarzadeh, Negin Moezi
2017-02-15T20:50:24Z
置信度 0.70
-
crossref
Yumei Yang, Haijun Lou, Xinnan Lin
2018-10-17T19:47:46Z
置信度 0.70
-
crossref
Jhen-Yu Tsai, Hsin-Hui Hu
2015-02-05T14:43:07Z
置信度 0.70
-
crossref
Shankaranand Jha, Santosh Kumar Choudhary
2020-03-25T08:38:34Z
置信度 0.70
-
crossref
C. Usha, P. Vimala, T. S. Arun Samuel, M. Karthigai Pandian
2020-04-25T09:02:45Z
置信度 0.70
-
crossref
Lishu Wu
2023-07-26T17:40:21Z
置信度 0.70
-
crossref
P. Prabhu Thapaswini
2025-12-17T03:23:51Z
置信度 0.70
-
The relentless scaling of conventional CMOS technology is confronting a fundamental power wall, driven by the thermal limits of thermionic emission in MOSFETs. This paper addresses this challenge by proposing a novel device architecture: the Heterojunction Gat…
crossref
Ayush Verma
2025-08-04T01:38:59Z
置信度 0.70
-
crossref
2024-06-17T16:02:25Z
置信度 0.70
-
crossref
Sanjay, B. Prasad, Anil Vohra
2020-11-02T14:03:08Z
置信度 0.70
-
In this manuscript, channel area fluctuation (CAF) effects on turn-on voltage ( V on ) and subthreshold swing (SS) in gate-all-around (GAA) nanowire (NW) tunnel field-effect transistor (TFET) with multi-bridge-channel (MBC) have been investigated for the first…
crossref
Seok Jung Kang, Jeong-Uk Park, Kyung Jin Rim, Yoon Kim 等
2020-01-22T04:51:54Z
置信度 0.70
-
An all-solution processed flexible thin-film transistor based on a PANI/PETA gate/gate insulator exhibited higher mobility than the device with a Si/SiO 2 gate/gate insulator because of large crystalline domains in the transition region.
crossref
Jin-Yong Hong, Dai Gun Yoon, Byung Doo Chin, Sung Hyun Kim
2015-12-09T11:12:45Z
置信度 0.70
-
Ballistic-transport simulations of an n-type MoTe2 junctionless gate-all-around (JL-GAA) nanowire FET with 20 nm gate length and 2 nm HfO2 gate dielectric are reported. At 300 K the device achieves ION = 41.58 µA/µm, ION/IOFF = 2.87×10^10, and SSmin = 62.76 mV…
crossref
SANDIP Majumdar
2026-05-12T17:26:28Z
置信度 0.70
-
crossref
Navaneet Kumar Singh, Rajib Kar, Durbadal Mandal
2022-03-26T02:03:51Z
置信度 0.70
-
crossref
2021-07-14T04:00:57Z
置信度 0.70
-
crossref
Arvind Ganesh, Jaskeerat Singh Mayall, Kshitij Goel, Sonam Rewari
2021-06-21T21:42:07Z
置信度 0.70
-
Abstract This study presents a gate-all-around InAs–Si vertical tunnel field-effect transistor with a triple metal gate (VTG-TFET). We obtained improved switching characteristics for the proposed design because of the improved electrostatic control on the chan…
crossref
Dariush Madadi, Saeed Mohammadi
2023-03-10T14:04:24Z
置信度 0.70
-
crossref
Jaya Madan, R. S. Gupta, Rishu Chaujar
2016-10-04T21:21:22Z
置信度 0.70
-
crossref
H. Borli, S. Kolberg, T. A. Fjeldly
2010-12-08T09:27:32Z
置信度 0.70
-
crossref
Bo Gyeong Kim, Jae Hwa Seo, Young Jun Yoon, Min Su Cho 等
2019-04-26T04:54:46Z
置信度 0.70
-
crossref
2006-10-02T15:17:01Z
置信度 0.70
-
crossref
B. Padmanaban, S. Sathiyamoorthy, R. Ramesh
2016-11-28T12:09:28Z
置信度 0.70
-
crossref
A.Josephine Anucia, D. Gracia, D.Jackuline Moni
2022-05-30T19:10:00Z
置信度 0.70
-
crossref
Huimei Zhou, Miaomiao Wang, Ernest Wu
2024-05-16T17:21:48Z
置信度 0.70
-
crossref
TaeYoon An, SoYoung Kim
2013-11-01T20:41:09Z
置信度 0.70
-
crossref
Yogesh Pratap, Sachin Kumar, R. S. Gupta, Mridula Gupta
2021-03-31T14:03:02Z
置信度 0.70
-
crossref
Avtar Singh, Chandan Kumar Pandey
2021-01-28T12:44:47Z
置信度 0.70
-
crossref
Cher Ming Tan, Xiangchen Chen
2016-04-28T20:18:49Z
置信度 0.70
-
crossref
Dariush Madadi, Saeed Mohammadi
2024-02-12T09:03:29Z
置信度 0.70
-
crossref
Hou Xiao-Yu, Zhou Fa-Long, Huang Ru, Zhang Xing
2007-02-27T09:14:48Z
置信度 0.70
-
crossref
Priyanka Pandey, Pooja Puri, Harsupreet Kaur
2018-10-04T18:41:22Z
置信度 0.70
-
crossref
Dheeraj Sharma, Santosh Kumar Vishvakarma
2012-11-16T04:37:40Z
置信度 0.70
-
crossref
P. Kalavade, K.C. Saraswat
2002-11-13T15:00:11Z
置信度 0.70
-
crossref
Dheeraj Sharma, Santosh Kumar Vishvakarma
2013-03-08T19:43:15Z
置信度 0.70
-
Abstract The transport and noise properties of fabricated, high‐performance, gate‐all‐around silicon liquid‐gated nanowire field‐effect transistor devices are investigated in different concentrations of MgCl 2 solutions. The critical concentration of MgCl 2 so…
crossref
Yongqiang Zhang, Nazarii Boichuk, Denys Pustovyi, Valeriia Chekubasheva 等
2023-09-23T00:36:48Z
置信度 0.70
-
crossref
Amit Kumar Behera, Chithraja Rajan, Dip Prakash Samajdar, Anil Lodhi 等
2021-08-05T14:02:38Z
置信度 0.70
-
crossref
Chunshan Yin, P.C.H. Chan, V.W.C. Chan
2003-06-25T23:45:08Z
置信度 0.70
-
A compact model for the quasi-ballistic cylindrical gate-all-around MOSFET was developed by supplementing the ballistic framework previously disclosed by us with an original energy quantization model. The ballistic mobility is calculated for both degenerate an…
crossref
P. Vimala
2015-05-06T13:56:35Z
置信度 0.70