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• Optics Contamination
  crossref Charles Tarrio, Shannon B. Hill, Robert F. Berg, Saša Bajt 2018-02-09T00:22:41Z 置信度 0.70
• Tabletop EUV source could help lithography, life sciences
  crossref Winn Hardin 2008-04-23T18:20:04Z 置信度 0.70
• Front Matter: Volume 11609
  crossref 2021-04-19T22:38:12Z 置信度 0.70
• Optimizing and Addressing Stitch Challenges in High-NA EUV Lithography for Large Die Designs
  crossref Yongchan James Ban, Gangsic Kim, Hosoon Shin 2024-11-29T18:49:10Z 置信度 0.70
• 3D mask effects in high NA EUV imaging
  crossref Andreas Erdmann, Peter Evanschitzky, Gerardo Bottiglieri, Eelco van Setten 等 2019-03-14T21:13:40Z 置信度 0.70
• Multilayer Coatings for the EUV Lithography Front-End Test Bed
  Good illumination uniformity at the mask and wafer planes, and high wafer throughput in the EUVL front-end test bed facility at LLNL require graded period multilayer (ML) coatings on several of the optics. The ML deposition was accomplished using a newly devel…
  crossref S. P. Vernon, M. J. Carey, D. P. Gaines, F. J. Weber 2023-02-15T15:36:21Z 置信度 0.70
• Quantitative phase imaging of EUV masks
  crossref Ryan H. Miyakawa, Stuart Sherwin, Wenhua Zhu, Markus Benk 等 2020-04-20T20:36:41Z 置信度 0.70
• Novel metal containing resists for EUV lithography extendibility
  crossref Danilo De Simone, Safak Sayan, Satoshi Dei, Ivan Pollentier 等 2016-03-19T00:29:35Z 置信度 0.70
• Modeling of emission spectrum of plasma EUV (13.5 nm) and shorter wavelength (≤7 nm) sources
  crossref Akira Sasaki 2021-02-19T22:02:46Z 置信度 0.70
• Development of Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography
  crossref Katsuhiko Murakami, Masayuki Shiraishi 2004-01-22T12:04:01Z 置信度 0.70
• Study on RLS trade-off resist upgrade for production ready EUV lithography
  crossref Junghyung Lee, Jieun Kim, Seunguk Jeong, Mijung Lim 等 2016-03-19T00:29:35Z 置信度 0.70
• Progress in EUV resists for contact holes printing using EUV interference lithography
  crossref Xiaolong Wang, Li-Ting Tseng, Iacopo Mochi, Michaela Vockenhuber 等 2019-08-29T16:27:08Z 置信度 0.70
• Modeling of bi-spectral primary source for the EUV lithography
  crossref A. P. Zhevlakov, R. P. Seisyan, V. G. Bespalov, V. V. Elizarov 等 2015-03-19T19:31:21Z 置信度 0.70
• Holistic analysis of aberration induced overlay error in EUV lithography
  crossref Yulu Chen, Lars Liebmann, Lei Sun, Allen H. Gabor 等 2018-03-19T17:40:25Z 置信度 0.70
• Upgrade to the SHARP EUV mask microscope
  crossref Markus P. Benk, Weilun Chao, Ryan H. Miyakawa, Kenneth Goldberg 等 2019-03-26T16:33:33Z 置信度 0.70
• Synchrotron Radiation Sources for EUVL Applications
  crossref Obert Wood, Alastair MacDowell 2010-11-09T23:48:49Z 置信度 0.70
• Freeforms in EUV Lithography Projection Optics
  crossref David M. Williamson 2015-06-08T11:29:22Z 置信度 0.70
• Overcoming mask blank defects in EUV lithography
  crossref Abbas Rastegar 2009-05-08T16:32:52Z 置信度 0.70
• Modeling the EUV multilayer deposition process on EUV blanks
  crossref V. Jindal, P. Kearney, Jenah Harris-Jones, Alan Hayes 等 2011-03-26T18:06:07Z 置信度 0.70
• Development of EUV lithography tools at Nikon
  crossref Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba 等 2011-03-30T18:10:52Z 置信度 0.70
• Development of At-Wavelength Mask Microscopes for EUV Lithography
  crossref Tetsuo HARADA 2025-08-17T22:07:52Z 置信度 0.70
• Front Matter: Volume 9776
  crossref 2016-08-02T19:36:45Z 置信度 0.70
• Optics for EUV production
  crossref Martin Lowisch, Peter Kuerz, Hans-Juergen Mann, Oliver Natt 等 2010-03-18T22:10:38Z 置信度 0.70
• Roughness and variability in EUV lithography: Who is to blame? (part 1)
  crossref Alessandro Vaglio Pret, Roel Gronheid, Todd R. Younkin, Gustaf Winroth 等 2013-04-01T18:31:55Z 置信度 0.70
• A study of the effect of pellicle support structures on aerial-image quality in EUV lithography by rigorous electromagnetic simulation
  crossref Michael S. Yeung, Eytan Barouch, Hye-Keun Oh 2014-04-17T20:38:15Z 置信度 0.70
• Across scanner platform optimization to enable EUV lithography at the 10-nm logic node
  crossref Jan Mulkens, Jaap Karssenberg, Hannah Wei, Marcel Beckers 等 2014-04-17T20:38:15Z 置信度 0.70
• Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison
  crossref Weimin Gao, Vincent Wiaux, Wolfgang Hoppe, Lawrence S. Melvin 等 2018-03-19T17:37:49Z 置信度 0.70
• Directly patterned inorganic hardmask for EUV lithography
  crossref Jason K. Stowers, Alan Telecky, Michael Kocsis, Benjamin L. Clark 等 2011-03-31T20:11:17Z 置信度 0.70
• EUV mask polarization effects on sub-7nm node imaging
  crossref Lilian Neim, Bruce W. Smith, Germain L. Fenger 2020-03-23T22:46:25Z 置信度 0.70
• Front Matter: Volume 8322
  crossref 2012-04-26T18:16:26Z 置信度 0.70
• EUV Sources for High-Volume Manufacturing
  crossref Igor V. Fomenkov, Alexander A. Schafgans, David C. Brandt, Alexander Ershov 等 2018-02-08T19:22:46Z 置信度 0.70
• Electron-Induced Chemical Transformations in Polymer Films
  crossref Maximillian Mueller 2024-08-21T23:13:24Z 置信度 0.70
• Front Matter: Volume 9422
  crossref 2015-04-22T19:38:29Z 置信度 0.70
• Capillary Z-Pinch Source
  crossref Yusuke Teramoto, Hiroto Sato, Masaki Yoshioka 2010-11-09T23:48:49Z 置信度 0.70
• High brightness EUV light source modeling
  crossref Sergey V. Zakharov, Peter Choi, Vasily S. Zakharov 2010-03-18T18:10:38Z 置信度 0.70
• Increasing EUV source efficiency via recycling of radiation power
  crossref Ahmed Hassanein, Valeryi Sizyuk, Tatyana Sizyuk, Ken Johnson 2018-03-19T17:39:55Z 置信度 0.70
• EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs
  crossref E. Steve Putna, Todd R. Younkin, Roman Caudillo, Manish Chandhok 2010-03-17T22:05:47Z 置信度 0.70
• Patterning performance of chemically amplified resist in EUV lithography
  crossref Tatsuya Fujii, Shogo Matsumaru, Tomotaka Yamada, Yoshitaka Komuro 等 2016-03-19T00:29:35Z 置信度 0.70
• Development of molecular resist derivatives for EUV lithography
  crossref D. Patrick Green, Vipul Jain, Brad Bailey, Mike Wagner 等 2013-04-01T18:31:55Z 置信度 0.70
• EUV lithography update
  crossref Charles Gwyn 2008-08-28T15:07:21Z 置信度 0.70
• High-Brightness LDP Source for Mask Inspection
  crossref Yusuke Teramoto 2018-02-09T00:22:43Z 置信度 0.70
• Optical proximity effects in 4-nm EUV lithography: a rigorous study using a new PSTD method
  crossref Michael Yeung, Eytan Barouch 2015-03-16T22:41:34Z 置信度 0.70
• Analysis and control of thermal and structural deformation of projection optics for 22-nm EUV lithography
  crossref Guanghua Yang, Yanqiu Li 2012-03-15T10:07:50Z 置信度 0.70
• Impact of mask line roughness in EUV lithography
  crossref Alessandro Vaglio Pret, Roel Gronheid, Trey Graves, Mark D. Smith 等 2011-04-01T00:11:17Z 置信度 0.70
• Optical system for EUV lithography
  crossref John Taylor 2015-01-06T19:48:30Z 置信度 0.70
• Optical Resolution Enhancements
  crossref Andreas Erdmann 2021-02-23T20:17:29Z 置信度 0.70
• Impact of aberrations in EUV lithography: metal to via edge placement control
  crossref John L. Sturtevant, Lianghong Yin, Ananthan Raghunathan, Germain L. Fenger 等 2018-03-19T21:40:20Z 置信度 0.70
• Systematic assessment of the contributors of line edge roughness in EUV lithography using simulations
  crossref John J. Biafore, Harry J. Levinson, Todd Bailey, Anindarupa Chunder 等 2018-03-19T17:36:30Z 置信度 0.70
• EUV lithography patterning challenges
  crossref Patrick Naulleau 2016-11-08T13:30:16Z 置信度 0.70
• Effect of cleaning on EUV masks
  crossref Jeffrey W. Roberts 2013-04-01T18:31:55Z 置信度 0.70
• Deconstructing contact hole CD printing variability in EUV lithography
  crossref D. Civay, T. Wallow, N. Doganaksoy, E. Verduijn 等 2014-04-17T16:38:15Z 置信度 0.70
• The potential of EUV lithography
  crossref Harry J. Levinson 2019-08-29T16:26:55Z 置信度 0.70
• Development of practical flare correction tool for full chip in EUV lithography
  crossref Taiga Uno, Hiromitsu Mashita, Masahiro Miyairi, Toshiya Kotani 2012-03-23T09:24:08Z 置信度 0.70
• Comparative analysis of shot noise in EUV and e-beam lithography
  crossref Suchit Bhattarai, Weilun Chao, Andrew R. Neureuther, Patrick P. Naulleau 2014-04-17T20:38:15Z 置信度 0.70
• Best focus alignment through pitch strategies for hyper-NA EUV lithography
  crossref Inhwan Lee, Joern-Holger Franke, Vicky Philipsen, Kurt Ronse 等 2024-04-09T17:24:20Z 置信度 0.70
• Optimization of image-based aberration metrology for EUV lithography
  crossref Zac Levinson, Germain Fenger, Andrew Burbine, Anthony R. Schepis 等 2014-04-17T20:38:15Z 置信度 0.70
• Material-Driven Resolution Enhancements
  crossref Andreas Erdmann 2021-02-23T20:17:53Z 置信度 0.70
• Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography (Conference Presentation)
  crossref Andreas Erdmann, Hazem M. S. Mesilhy, Peter Evanschitzky, Vicky Philipsen 等 2021-12-28T16:33:20Z 置信度 0.70
• Ion dynamics in laser-produced plasma for EUV generation in nanolithography devices
  crossref Tatyana Sizyuk 2019-05-31T21:13:27Z 置信度 0.70
• EUV lithography imaging using novel pellicle membranes
  crossref Ivan Pollentier, Johannes Vanpaemel, Jae Uk Lee, Christoph Adelmann 等 2016-03-18T20:29:35Z 置信度 0.70
• Contrast optimization for 0.33NA EUV lithography
  crossref Jo Finders, Sander Wuister, Thorsten Last, Gijsbert Rispens 等 2016-04-26T19:37:54Z 置信度 0.70
• Evaluation of EUV resist performance using interference lithography
  crossref E. Buitrago, O. Yildirim, C. Verspaget, N. Tsugama 等 2015-03-13T19:34:50Z 置信度 0.70
• EUV Masks and Pellicles
  crossref Harry J. Levinson 2025-12-02T16:36:09Z 置信度 0.70
• Sources of EUV Light
  crossref Harry J. Levinson 2025-12-02T16:36:10Z 置信度 0.70
• Normal Incidence (Multilayer) Collector Contamination
  crossref David Ruzic, Shailendra Srivastava 2009-12-04T17:05:29Z 置信度 0.70
• Enabling 0.33NA EUV lithography patterning towards MP16 SADP semi-damascene metallization, setting the benchmark for High-NA EUV
  crossref Yannick Hermans, Stefan Decoster, Chen Wu, Jan Doise 等 2024-11-12T21:39:31Z 置信度 0.70
• EUVL System Patterning Performance
  crossref Gregg M. Gallatin, Patrick P. Naulleau 2018-02-09T00:22:49Z 置信度 0.70
• EUV resists fundamental studies at NewSUBARU synchrotron light facility especially on EUV high-NA lithography
  crossref Takeo Watanabe, Shinji Yamakawa, Tetsuo Harada 2023-11-22T12:14:46Z 置信度 0.70
• Application of alternative developer solutions for EUV lithography
  crossref Julius Joseph S. Santillan, Masahiko Harumoto, Harold W. Stokes, Chisayo Mori 等 2020-03-23T22:46:36Z 置信度 0.70
• Stochastic resist patterning simulation using attenuated PSM for EUV lithography
  crossref Seongchul Hong, Seejun Jeong, Jae Uk Lee, Seung Min Lee 等 2013-04-01T18:31:55Z 置信度 0.70
• Simulation-assisted layout biasing in EUV lithography and prediction of an optimum resist parameter space
  crossref Chandra Sarma, John Biafore, Kyoungyong Cho, Karen Petrillo 等 2013-04-01T22:31:55Z 置信度 0.70
• Solid-State Lasers in EUV Lithography and Metrology
  crossref Jiří Mužík, Martin Smrž, Siva S. Nagisetty 2023-09-19T16:39:53Z 置信度 0.70
• Computational distortion prediction method considering characteristics of EUV lithography
  crossref Jong-Hyun Hwang, Jaeil Lee, Hyeon-jun Ha, Jung-hwan Kim 等 2024-04-09T17:24:16Z 置信度 0.70
• High-resolution EUV lithography using a multi-trigger resist
  crossref Alex P. G. Robinson, Carmen Popescu, Dimitrios Kazazis, Alexandra McClelland 等 2018-03-19T17:39:10Z 置信度 0.70
• Front Matter: Volume 10957
  crossref 2019-04-03T19:51:35Z 置信度 0.70
• Line-edge roughness performance targets for EUV lithography
  crossref Timothy A. Brunner, Xuemei Chen, Allen Gabor, Craig Higgins 等 2017-03-25T07:35:53Z 置信度 0.70
• Evaluation of EUV resist performance with interference lithography towards 11 nm half-pitch and beyond
  crossref Yasin Ekinci, Michaela Vockenhuber, Mohamad Hojeij, Li Wang 等 2013-04-01T22:31:55Z 置信度 0.70
• Vacuum Technology for EUV Lithography
  crossref Jang Hun Joo 2014-11-24T02:28:02Z 置信度 0.70
• Interferometric measurement of phase in EUV masks
  crossref Wenhua Zhu, Ryan Miyakawa, Lei Chen, Patrick Naulleau 2019-06-04T21:12:55Z 置信度 0.70
• Projecting EUV photo-speeds for future logic nodes
  crossref Mark Neisser, Harry J. Levinson 2020-03-23T22:46:13Z 置信度 0.70
• Novel resist systems for EUV lithography : LER, chain-scission, nanoparticle and MORE
  crossref Brian Cardineau 2025-05-28T13:58:07Z 置信度 0.70
• Free electron lasers for 13nm EUV lithography: RF design strategies to minimise investment and operational costs
  crossref Simon Keens, Bernhard Rossa, Marcel Frei 2016-03-19T00:29:35Z 置信度 0.70
• High-Power EUV Source by Gigaphoton for High-Volume Manufacturing
  crossref Taku Yamazaki, Hakaru Mizoguchi, Tatsuya Yanagida, Krzysztof M. Nowak 等 2018-02-09T00:22:47Z 置信度 0.70
• Investigating EUV radiochemistry with condensed phase photoemission
  crossref Jonathan Ma, Andrew R. Neureuther, Patrick P. Naulleau 2019-05-30T22:51:12Z 置信度 0.70
• Printability study of EUV double patterning for CMOS metal layers
  crossref Danilo De Simone, Geert Vandenberghe 2019-03-14T21:13:40Z 置信度 0.70
• Alternative EUV mask with platinum-tungsten alloy for high-NA EUV lithography
  crossref Yunsoo Kim, Dongmin Jeong, Minsun Cho, Jinho Ahn 2022-09-23T21:54:23Z 置信度 0.70
• Outgas evaluation of cable materials for EUV lithography system
  crossref Kazuki Hosoda, Takashi Namikawa, Shinji Yamakawa, Tetsuo Harada 等 2024-09-24T19:17:24Z 置信度 0.70
• Fundamentals of EUVL Scanners
  crossref Hans C. Jasper, Jan van Schoot 2018-02-09T00:22:48Z 置信度 0.70
• Analysis, simulation, and experimental studies of YAG and CO 2 laser-produced plasma for EUV lithography sources
  crossref A. Hassanein, V. Sizyuk, S. S. Harilal, T. Sizyuk 2010-03-18T18:10:38Z 置信度 0.70
• Physical resist models and their calibration: their readiness for accurate EUV lithography simulation
  crossref U. K. Klostermann, T. Mülders, T. Schmöller, G. F. Lorusso 等 2010-03-17T22:05:47Z 置信度 0.70
• The k1-factor and stochasticity in EUV lithography: from the perspective of multi-photon-induced collaborative molecular dissolution
  crossref Hiroshi Fukuda 2024-11-12T21:39:40Z 置信度 0.70
• Overview of Lithographic Processing
  crossref Andreas Erdmann 2021-02-23T20:17:47Z 置信度 0.70
• Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography
  crossref Junichi Fujimoto, Tsukasa Hori, Tatsuya Yanagida, Takeshi Ohta 等 2012-03-15T14:07:50Z 置信度 0.70
• Erosion of Condenser Optics Exposed to EUV Sources
  crossref Leonard Klebanoff, Richard Anderson, Dean Buchenauer, Neal Fornaciari 等 2010-11-09T23:48:49Z 置信度 0.70
• Photonic superlattice multilayers for EUV lithography infrastructure
  crossref Ronald Meisels, Friedemar Kuchar 2018-09-19T22:59:41Z 置信度 0.70
• Efficient multi-die placement for blank defect mitigation in EUV lithography
  crossref Yuelin Du, Hongbo Zhang, Martin D. F. Wong, Yunfei Deng 等 2012-03-23T09:24:08Z 置信度 0.70
• Under pressure - nanoimprint lithography offers an economical, high-resolution alternative to EUV and next-generation lithography
  crossref Babak Heidari 2007-09-04T18:20:33Z 置信度 0.70
• Actinic EUV scatterometry for parametric mask quantification
  crossref Stuart Sherwin, Andrew Neureuther, Patrick Naulleau 2018-03-19T17:39:29Z 置信度 0.70
• Mask characterization studies of new alternative thin EUV absorber (Conference Presentation)
  crossref Henry H. Kamberian 2021-12-28T11:37:59Z 置信度 0.70
• Antimony photoresists for EUV lithography: mechanistic studies
  crossref Michael Murphy, Amrit Narasimhan, Steven Grzeskowiak, Jacob Sitterly 等 2017-03-31T16:03:13Z 置信度 0.70