半导体与先进封装 · 全部实体（第 18 / 100 页）

本页收录第 1701–1800 条，共 10000 条 · 返回 半导体与先进封装 首页

• EUV insertion strategy into logic technology on the horizon of scaling paradigm change
  crossref Ryoung-Han R. Kim 2019-03-14T21:13:33Z 置信度 0.70
• High-NA EUV lithography exposure tool: program progress
  crossref Jan Van Schoot, Eelco van Setten, Kars Troost, Sjoerd Lok 等 2020-03-23T18:46:31Z 置信度 0.70
• Intense EUV incoherent plasma sources for EUV lithography and other applications
  crossref W.T. Silfvast 2002-08-24T20:00:39Z 置信度 0.70
• Front Matter: Volume 10583
  crossref 2018-05-08T22:53:47Z 置信度 0.70
• Phase correcting layers in EUV imaging systems for microlithography
  The requirements on the shape accuracy of reflecting surfaces in a projection system for EUV (extreme UV) microlithography are very severe. We propose the use of thin correcting layers with a strongly reduced optical contrast in the wavelength region of intere…
  crossref Joseph Braat 2023-02-15T11:01:31Z 置信度 0.70
• Flare modeling and calculation on EUV optics
  crossref M. Shiraishi, T. Oshino, K. Murakami, H. Chiba 2010-03-17T18:05:47Z 置信度 0.70
• Successors of ArF Water-Immersion Lithography: EUV Lithography, Multi-e-beam Maskless Lithography, or Nanoimprint?
  crossref Burn J. Lin 2008-12-22T23:03:24Z 置信度 0.70
• On the dependencies of the stochastic patterning-failure cliffs in EUVL lithography
  crossref Peter De Bisschop, Eric Hendrickx 2020-03-23T22:46:41Z 置信度 0.70
• Table-top EUV/soft x-ray source for metrological applications
  crossref Klaus Mann, Jonathan Holburg, Simon Lange, Matthias Müller 等 2019-05-16T16:11:17Z 置信度 0.70
• Mo-based multilayer for beyond EUV lithography
  Beyond EUV (BEUV) lithography has been developing for further downscaling of semiconductor devices. We propose Mo₂N/B multilayer (ML) for designing high-reflectance, high-durability BEUV mirrors. Background: High-reflectance MLs are key components for photomas…
  crossref Naoki Hayase, Masashi Yoshimura, Satoru Suzuki, Shinji Yamakawa 等 2026-08-06T13:08:48Z 置信度 0.70
• EUV photolithography: resist progress and challenges
  crossref Hong Xu, Vasiliki Kosma, Emmanuel Giannelis, Christopher K. Ober 等 2018-03-19T17:38:12Z 置信度 0.70
• Free-standing hybrid Zr/NGF filter for high-power EUV purification in EUV lithography
  crossref Dong-Wook Shin, Myeong Jin Jeong, Ki-bong Nam, Munja Kim 等 2025-10-13T21:38:41Z 置信度 0.70
• Novel monitoring of EUV litho cluster for manufacturing insertion
  crossref Vincent Truffert, Kit Ausschnitt, Vineet Vijayakrishnan Nair, Koen D'havé 2020-03-23T22:46:37Z 置信度 0.70
• Computational lithography and patterning evaluation to support EUV high-NA stitching
  crossref Cyrus E. Tabery, Jiuning Hu, Rongkuo Zhao, Christoph Hennerkes 等 2024-04-09T17:57:24Z 置信度 0.70
• Zn-Ti Oxo Cluster Photoresists for Euv Lithography: Cluster Structure and Lithographic Performance
  crossref Xiaojun Peng, Daohan Wang, runfeng Xu, pengzhong Chen 等 2024-03-22T00:10:15Z 置信度 0.70
• New developments in ligand-stabilized metal oxide nanoparticle photoresists for EUV lithography
  crossref Christopher Ober, Jing Jiang, Ben Zhang, Li Li 等 2015-05-28T08:13:39Z 置信度 0.70
• Development of EUV lithography tool technologies at Nikon
  crossref Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba 等 2012-03-15T10:07:50Z 置信度 0.70
• Inspecting EUV mask blanks with a 193nm system
  crossref Stan Stokowski, Joshua Glasser, Gregg Inderhees, Phani Sankuratri 2010-03-18T22:10:38Z 置信度 0.70
• Research activities on EUV mask at NewSUBARU synchrotron light facility for the advanced EUV lithography
  crossref Takeo Watanabe, Tetsuo Harada, Shinji Yamakawa 2023-11-22T12:17:06Z 置信度 0.70
• A new beamline for EUV lithography research
  crossref H. H. Solak 2003-02-06T19:34:32Z 置信度 0.70
• PROLITH for EUV lithography
  crossref 2008-11-28T11:05:18Z 置信度 0.70
• Tin Mitigation in EUV Sources
  crossref Gianluca Panici, David N. Ruzic 2023-09-19T16:31:37Z 置信度 0.70
• 22X mask cleaning effects on EUV lithography process and lifetime
  crossref Simi A. George, Robert J. Chen, Lorie-Mae Baclea-an, Patrick P. Naulleau 2011-03-31T20:11:17Z 置信度 0.70
• The Evolvement of Lithography Optics Towards Advanced EUV Lithography: Enabling the Continuation of Moore’s Law for Six Decades
  crossref Winfried Kaiser 2024-03-27T18:51:22Z 置信度 0.70
• CO<sub>2</sub> Laser Produced Tin Plasma Light Source as the Solution for EUV Lithography
  crossref Akira Endo 2012-03-23T19:39:19Z 置信度 0.70
• EUV-Specific Imaging Topics
  crossref Peter De Bisschop 2025-02-26T23:29:58Z 置信度 0.70
• Review for "Advances in Metal-based Photoresist Materials for EUV Lithography and Lithographic Mechanisms"
  crossref 2025-08-04T21:01:26Z 置信度 0.70
• Lithographic Projection Systems: Advanced Topics
  crossref Andreas Erdmann 2021-02-23T20:17:08Z 置信度 0.70
• Review for "Advances in Metal-based Photoresist Materials for EUV Lithography and Lithographic Mechanisms"
  crossref 2025-08-04T21:01:26Z 置信度 0.70
• Progress on EUV pellicle and pellicle infrastructure for high volume manufacturing
  crossref Raymond Lafarre, Raymond Maas 2021-02-19T22:21:19Z 置信度 0.70
• Review for "Advances in Metal-based Photoresist Materials for EUV Lithography and Lithographic Mechanisms"
  crossref 2025-08-04T21:01:26Z 置信度 0.70
• Assessing out-of-band flare effects at the wafer level for EUV lithography
  crossref Simi A. George, Patrick P. Naulleau, Charles D. Kemp, Paul E. Denham 等 2010-03-18T22:10:38Z 置信度 0.70
• Recent progress in nanoparticle photoresists development for EUV lithography
  crossref Kazuki Kasahara, Vasiliki Kosma, Jeremy Odent, Hong Xu 等 2016-03-18T20:29:35Z 置信度 0.70
• EUVL System Patterning Performance
  crossref Patrick Naulleau, John Bjorkholm, Manish Chandhok 2009-12-04T22:05:29Z 置信度 0.70
• Electron-Gun-Driven EUV Lithography System
  The interaction of a high-brightness electron beam with a gas target has been proposed as a "granular" source of radiation that could generate sufficient power for extreme ultra-violet lithography (EUVL) applications. A system based on this concept that seeks …
  crossref Alan M. M. Todd, Ira S. Lehrman, Jayaram Krishnaswamy, Vincent Calia 等 2023-02-15T15:38:00Z 置信度 0.70
• The EUV-Lamp: A Discharge-Produced Metrology EUV Source
  crossref Andreas Biermanns-Föth, Rainer Lebert, Christoph Phiesel, Thomas Missalla 2023-09-19T16:06:48Z 置信度 0.70
• Metrologies Supporting EUV Lithography
  crossref Patrick Naulleau 2016-05-31T21:02:20Z 置信度 0.70
• Beyond EUV binary and phase shift masks simulation
  crossref Naoki Hayase, Tetsuo Harada 2024-08-26T23:58:32Z 置信度 0.70
• Comprehensive EUV lithography model
  crossref Mark D. Smith, Trey Graves, John Biafore, Stewart Robertson 等 2011-03-26T22:06:07Z 置信度 0.70
• Review for "Advances in Metal-based Photoresist Materials for EUV Lithography and Lithographic Mechanisms"
  crossref 2025-08-04T21:01:26Z 置信度 0.70
• Optical Technology for EUV Lithography
  A high-throughput optical system that has a bouncing number of only four, including a reflective mask, was designed. The illumination system is comprised of a single tilted-ellipsoidal mirror, that is suitable for a two-aspherical-mirror ring-field imaging sys…
  crossref Masaaki Ito, Souichi Katagiri, Hiromasa Yamanashi, Eiichi Seya 等 2023-02-15T16:02:55Z 置信度 0.70
• Scaling EUV and holistic lithography to support Moore’s Law through the AI era
  crossref Christophe Fouquet 2025-04-22T18:31:23Z 置信度 0.70
• EUV lithography: progress, challenges, and outlook
  crossref S. Wurm 2014-10-17T22:32:27Z 置信度 0.70
• Vote-taking for EUV lithography: a radical approach to mitigate mask defects
  crossref Timothy A. Brunner, Melih Ozlem, Geng Han, Jed Rankin 等 2017-03-25T11:35:53Z 置信度 0.70
• EUV Lithography
  crossref Chimaobi Mbanaso, Gregory Denbeaux 2016-11-28T13:24:54Z 置信度 0.70
• New Anionic Photoacid Generator Bound Polymer Resists for EUV Lithography
  crossref 2020-04-10T07:51:42Z 置信度 0.70
• Zinc-based metal oxoclusters: towards enhanced EUV absorptivity
  crossref Neha Thakur, Michaela Vockenhuber, Yasin Ekinci, Sonia Castellanos Ortega 2019-03-26T20:35:18Z 置信度 0.70
• Technology for LPP Sources
  crossref Uwe Stamm, Kai Gäbel 2010-11-09T23:48:49Z 置信度 0.70
• 3D mask modeling for EUV lithography
  crossref Julien Mailfert, Christian Zuniga, Vicky Philipsen, Konstantinos Adam 等 2012-03-23T13:24:08Z 置信度 0.70
• High NA EUV patterning ecosystem readiness to continue the logic scaling roadmap
  crossref Kurt G. Ronse 2024-09-18T18:54:56Z 置信度 0.70
• Waveguide effect in high-NA EUV lithography: The key to extending EUV lithography to the 4-nm node
  crossref Michael Yeung, Eytan Barouch, Hye-Keun Oh 2015-04-20T11:13:24Z 置信度 0.70
• Exploring the potential of EB lithography in EUV photomask manufacturing
  crossref Mei Ebisawa, Tsukasa Abe, Yukihiro Fujimura, Izumi Hotei 等 2024-02-23T19:13:10Z 置信度 0.70
• Advanced multilayer mirror design to mitigate EUV shadowing
  crossref Stuart Sherwin, Laura Waller, Andrew R. Neureuther, Patrick Naulleau 2019-03-14T17:13:45Z 置信度 0.70
• Synchrotron-based Metrology Tools for EUV Lithography
  crossref Robert E. Vest, Frank Scholze, Yasin Ekinci, Charles Tarrio 等 2023-09-19T16:34:37Z 置信度 0.70
• Moore's law, lithography, and how optics drive the semiconductor industry
  crossref G. Dan Hutcheson 2018-03-19T21:41:18Z 置信度 0.70
• EUV source modeling
  crossref S. Kulkarni, I. Golovkin, J. MacFarlane 2014-03-18T21:56:25Z 置信度 0.70
• Stochastic and systematic patterning failure mechanisms for contact-holes in EUV lithography: Part 2
  crossref Alessandro Vaglio Pret, Peter De Bisschop, Mark D. Smith, John J. Biafore 2014-03-19T01:56:25Z 置信度 0.70
• Study on restricting factors of practical k1 limit in 0.33NA EUV lithography
  crossref Sunyoung Koo, Mijung Lim, Inhwan Lee, Sarohan Park 等 2017-05-05T15:32:32Z 置信度 0.70
• Optimization and sensitivity enhancement of high-resolution molecular resist for EUV lithography
  crossref Andreas Frommhold, Alexandra McClelland, John Roth, Roberto A. Fallica 等 2016-03-19T00:29:35Z 置信度 0.70
• Shot noise: A 100 year history, with applications to lithography
  crossref Chris A. Mack 2018-05-22T12:12:46Z 置信度 0.70
• Toward 10nm half-pitch in EUV lithography: results on resist screening and pattern collapse mitigation techniques
  crossref Tero S. Kulmala, Michaela Vockenhuber, Elizabeth Buitrago, Roberto Fallica 等 2015-04-06T21:34:19Z 置信度 0.70
• Experimental investigation of a high-k reticle absorber system for EUV lithography
  crossref Jo Finders, Robbert de Kruif, Frank Timmermans, Jara García Santaclara 等 2019-03-14T17:13:49Z 置信度 0.70
• Pattern collapse mitigation strategies for EUV lithography
  crossref Dario L. Goldfarb, Robert L. Bruce, James J. Bucchignano, David P. Klaus 等 2012-03-15T10:07:50Z 置信度 0.70
• Study of Gd/Tb LPP emission near λ = 6.7nm for beyond EUV lithography
  crossref Liang Yin, Hanchen Wang, Brendan Reagan, Cory Baumgarten 等 2016-03-18T20:29:35Z 置信度 0.70
• EUV vote-taking lithography: crazy... or not?
  crossref Joost Bekaert, Eric Hendrickx, Mark A. van de Kerkhof, Michiel Kupers 等 2018-03-19T17:40:08Z 置信度 0.70
• Evaluation of resist performance with EUV interference lithography for sub-22-nm patterning
  crossref Yasin Ekinci, Michaela Vockenhuber, Bernd Terhalle, Mohamad Hojeij 等 2012-03-15T10:07:50Z 置信度 0.70
• Monte Carlo EUV stochastic simulator (MESS): a chemistry-oriented lithography simulator
  crossref Patrick L. Theofanis, Oleg Tazetdinov 2022-05-26T17:45:22Z 置信度 0.70
• Actinic review of EUV masks
  crossref Heiko Feldmann, Johannes Ruoff, Wolfgang Harnisch, Winfried Kaiser 2010-03-18T22:10:38Z 置信度 0.70
• Liquid-Xenon-Jet LPP Source
  crossref Björn Hansson, Hans Hertz 2010-11-09T18:48:49Z 置信度 0.70
• Overlay and edge placement control strategies for the 7nm node using EUV and ArF lithography
  crossref Jan Mulkens, Michael Hanna, Hannah Wei, Vidya Vaenkatesan 等 2015-03-13T15:34:50Z 置信度 0.70
• The effect of line roughness on the reconstruction of line profiles for EUV masks from EUV scatterometry
  crossref Akiko Kato, Frank Scholze 2010-03-17T18:05:47Z 置信度 0.70
• Front Matter: Volume 9048
  crossref 2014-04-29T20:02:16Z 置信度 0.70
• Alternative developer solution/process for EUV lithography: ethyltrimethylammonium hydroxide (ETMAH)
  crossref Julius Joseph S. Santillan, Masahiko Harumoto, Tomohiro Motono, Andreia Figueiredo dos Santos 等 2021-02-19T22:18:25Z 置信度 0.70
• Plasma Capillary Source
  crossref Željko Andreić, Samir Ellwi, H. Kunze 2010-11-09T23:48:49Z 置信度 0.70
• Experience in EUV Photoemission with Multilayer Coated Optics
  Photoemission spectroscopy (PES) is a well -established experimental technique for the study of solids and surfaces. The essence of a PES experiment is to shine monochromatic radiation onto a sample and to measure the energy distribution of the photoemitted el…
  crossref Franco Cerrina 2023-02-15T15:37:32Z 置信度 0.70
• Colliding plasmas as potential EUV sources towards higher conversion efficiency
  crossref Tatyana Sizyuk, John P. Oliver 2019-03-14T21:13:34Z 置信度 0.70
• Development of resist material and process for hp-2x-nm devices using EUV lithography
  crossref Kentaro Matsunaga, Hiroaki Oizumi, Koji Kaneyama, Gousuke Shiraishi 等 2010-03-17T22:05:47Z 置信度 0.70
• EUV and immersion lithography integration in 7nm FPGA production
  crossref Qi Lin, Nui Chong, Toshiyuki Hisamura, Jonathan Chang 2022-05-26T17:34:45Z 置信度 0.70
• Towards manufacturing a 10nm node device with complementary EUV lithography
  crossref Jan V. Hermans, Huixiong Dai, Ardavan Niroomand, David Laidler 等 2013-04-01T22:31:55Z 置信度 0.70
• Holistic approaches toward high NA EUV lithography
  crossref Seiji Nagahara 2023-09-27T03:04:07Z 置信度 0.70
• Energy deposition and charging in EUV lithography: Monte Carlo studies
  crossref Liam Wiseheart, Amrit Narasimhan, Steven Grzeskowiak, Mark Neisser 等 2016-03-22T22:31:19Z 置信度 0.70
• Calibration of a MOx-specific EUV photoresist lithography model
  crossref Craig D. Needham, Amrit K. Narasimhan, Ulrich Welling, Lawrence S. Melvin 等 2020-03-23T18:46:38Z 置信度 0.70
• Overlay progress in EUV lithography towards adoption for manufacturing
  crossref Jan V. Hermans, David Laidler, Charles Pigneret, Andre van Dijk 等 2011-03-26T18:06:07Z 置信度 0.70
• Front Matter: Volume 10143
  crossref 2017-05-05T15:32:32Z 置信度 0.70
• Progress in EUV lithography towards manufacturing from an exposure tool perspective
  crossref Jan V. Hermans, David Laidler, Philippe Foubert, Koen D'havé 等 2012-03-15T14:07:50Z 置信度 0.70
• Front Matter: Volume 11323
  crossref 2020-04-13T22:47:11Z 置信度 0.70
• How to improve 'Chemical Stochastic' in EUV lithography
  crossref Toru Fujimori 2020-09-18T22:29:09Z 置信度 0.70
• SRAF requirements, relevance, and impact on EUV lithography for next-generation beyond 7nm node
  crossref Wei Guo, Fan Jiang, Yuyang Sun, Xima Zhuang 等 2018-03-19T21:39:46Z 置信度 0.70
• Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography
  crossref Xiaolei Liu, Xiangzhao Wang, Sikun Li, Guanyong Yan 等 2014-04-17T16:38:15Z 置信度 0.70
• Prospect of low-k1 lithography for EUV using polarization control
  crossref Martin Burkhardt, Rajiv Sejpal, Gopal Kenath 2026-04-09T22:03:19Z 置信度 0.70
• Front Matter: Volume 8679
  crossref 2013-07-15T20:26:09Z 置信度 0.70
• Measuring resist-induced contrast loss using EUV interference lithography
  crossref Andreas Langner, Harun H. Solak, Roel Gronheid, Eelco van Setten 等 2010-03-17T18:05:47Z 置信度 0.70
• Throughput simulations of the two-mask stage for high-NA EUV scanners
  crossref Kiwamu Takehisa 2024-08-26T23:58:30Z 置信度 0.70
• Silica aerogel can capture flying particles in EUV tools
  crossref Kazuya Ota, Jiro Inoue 2013-04-01T22:31:55Z 置信度 0.70
• Printability estimation of EUV blank defect using actinic image
  crossref Takeshi Yamane, Takashi Kamo, Rik Jonckheere 2018-03-19T17:40:30Z 置信度 0.70
• Sensitivity enhancement of the high-resolution xMT multi-trigger resist for EUV lithography
  crossref Carmen Popescu, Andreas Frommhold, Alexandra McClelland, John Roth 等 2017-03-25T07:35:53Z 置信度 0.70
• Effect of leaving group design on EUV lithography performance
  crossref Owendi Ongayi, Vipul Jain, Suzanne M. Coley, David Valeri 等 2013-04-01T18:31:55Z 置信度 0.70
• Smoothing of substrate pits using ion beam deposition for EUV lithography
  crossref Jenah Harris-Jones, Vibhu Jindal, Patrick Kearney, Ranganath Teki 等 2012-03-23T09:24:08Z 置信度 0.70
• Latest cluster performance for EUV lithography
  crossref H. Shite, K. Matsunaga, K. Nafus, H. Kosugi 等 2012-03-23T09:24:08Z 置信度 0.70
• Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks
  crossref Antoine Wojdyla, Alexander Donoghue, Markus P. Benk, Patrick P. Naulleau 等 2016-04-04T21:51:19Z 置信度 0.70