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• Restoration of the Korringa Relation in Disordered Liquid Systems via Transverse Relaxation (T<sub>2</sub>).
  europepmc 2026 置信度 0.80
• Influence of the vibration of extreme ultraviolet lithographic tool stages on imaging.
  europepmc 2023 置信度 0.80
• Transverse Deflection for Extreme Ultraviolet Pellicles.
  europepmc 2023 置信度 0.80
• Chemically Amplified Molecular Glass Photoresist Regulated by 2-Aminoanthracene Additive for Electron Beam Lithography and Extreme Ultraviolet Lithography.
  europepmc 2023 置信度 0.80
• Novel Mechanism-Based Descriptors for Extreme Ultraviolet-Induced Photoacid Generation: Key Factors Affecting Extreme Ultraviolet Sensitivity.
  europepmc 2023 置信度 0.80
• Resolution enhancement for high-numerical aperture extreme ultraviolet lithography by split pupil exposures: a modeling perspective
  Background: The lithographic imaging performance of extreme ultraviolet (EUV) lithography is limited by the efficiency of light diffraction and contrast fading caused by 3D mask effects. The dual monopole concept has been proposed by Joern-Holger Franke to mit…
  datacite Erdmann, Andreas, Mesilhy, Hazem, Evanschitzky, Peter, Bottiglieri, Gerardo 等 2024 置信度 0.66 EUV lithographyhigh-NAlow-n absorberresolution enhancement techniquescomputational lithography
• E450LMDAP, Teilvorhaben “Image Placement Optimizer”, WP2 “Lithography platforms”, Subtask der Task “Hyper NA EUV optical systems”: Aufbau einer Pilotlinie für die Herstellung von Mikrospiegel-Arrays für den Einsatz in EUV-Systemen (Task Leader: Carl Zeiss SMT GmbH) : Schlussbericht
  Illustrationen
  datacite Hilberath, Thomas Maria 2016 置信度 0.66 SpiegelEUV-SpektrometerMikrosystemtechnikEngineeringPhysics
• Schlussbericht zum Verbundprojekt "EUV-Lithographie für den 22nm-Knoten (EXEPT)", Teilvorhaben: "Arbeiten an Schlüsseltechnologien zur partikelfreien EUV-Maske" : Laufzeit 01.11.2010 - 31.08.2012
  Ill., graph. Darst.
  datacite Unknown 2013 置信度 0.66 Maske (Halbleitertechnologie)LithografieExtremes UltraviolettMechanical engineering, power engineeringHalbleitertechnologie
• 非线性薛定谔方程的欧拉修正体系:保结构数值实验与跨领域启示(合集)
  ⚠️ 勘误与纠正声明(版本更新) 本人早几天的欧拉修正存在严重错误。现在统一纠正如下: 修正核心为 a^{ σ+iθ} =a ^σ ⋅(cosθ+i⋅sinθ),其中 σ控制缩放、θ控制旋转,旋转角度与底数无关。 在这个体系下,建议实部和虚部都严格遵循不省略的表达。否则会发生逻辑混乱。 省略书写是造成混乱的原因之一。 实部虚部零值和不操作关系: • σ=0,θ ≠0:伸缩归一的旋转。任何非零模长都归一的旋转。 • σ ≠0,θ=0:只伸缩不旋转(模长 a σ ,相位不变)。 • σ=1,θ=0:不伸缩也不旋转(模长…
  datacite Zhang, Zhigang 2026 置信度 0.66 非线性薛定谔方程;欧拉修正;保结构格式;能量漂移;相位保真;光通信;半导体光刻;数值基准; NLS; Euler correction; Structure-preserving; Energy drift; Phase fidelity; Optical communication; Semiconductor lithography; Numerical benchmark
• 非线性薛定谔方程的欧拉修正体系:保结构数值实验与跨领域启示(合集)
  ⚠️ 勘误与纠正声明(版本更新) 本人早几天的欧拉修正存在严重错误。现在统一纠正如下: 修正核心为 a^{ σ+iθ} =a ^σ ⋅(cosθ+i⋅sinθ),其中 σ控制缩放、θ控制旋转,旋转角度与底数无关。 在这个体系下,建议实部和虚部都严格遵循不省略的表达。否则会发生逻辑混乱。 省略书写是造成混乱的原因之一。 实部虚部零值和不操作关系: • σ=0,θ ≠0:伸缩归一的旋转。任何非零模长都归一的旋转。 • σ ≠0,θ=0:只伸缩不旋转(模长 a σ ,相位不变)。 • σ=1,θ=0:不伸缩也不旋转(模长…
  datacite Zhang, Zhigang 2026 置信度 0.66 非线性薛定谔方程;欧拉修正;保结构格式;能量漂移;相位保真;光通信;半导体光刻;数值基准; NLS; Euler correction; Structure-preserving; Energy drift; Phase fidelity; Optical communication; Semiconductor lithography; Numerical benchmark
• Fundamental understanding of exposure and process chemistry of Sn-based metal oxide resists: effects of ambient environment during post-exposure delay and bake
  Metal oxide resists (MORs) have shown great promise for high-resolution patterning in extreme ultraviolet (EUV) lithography, with potential for integration into high-volume manufacturing. However, MORs have recently been shown to exhibit sensitivity to process…
  datacite Pollentier, Ivan, Holzmeier, Fabian, Fallica, Roberto, Chen, Ying-Lin 等 2026 置信度 0.66
• Fundamental understanding of exposure and process chemistry of Sn-based metal oxide resists: effects of ambient environment during post-exposure delay and bake
  Metal oxide resists (MORs) have shown great promise for high-resolution patterning in extreme ultraviolet (EUV) lithography, with potential for integration into high-volume manufacturing. However, MORs have recently been shown to exhibit sensitivity to process…
  datacite Pollentier, Ivan, Holzmeier, Fabian, Fallica, Roberto, Chen, Ying-Lin 等 2026 置信度 0.66
• The AI Capital-Infrastructure Barbell: A Supply-Side Risk Assessment
  A supply-side risk assessment of the AI compute build-out - method-first, not a crash call. Most AI-infrastructure commentary argues over demand (whether software revenue can justify the capex); this assessment takes the supply side instead - the physical, mat…
  datacite NM AI Research 2026 置信度 0.66 AI infrastructuresupply-side riskcompute build-outgrid constraintsTSMC
• Liquid Memory: A Fluid-Based Storage Architecture Breaking the 2D/3D Solid-State Paradigm-Version1.1
  change version1.0 license To (CC BY-SA 4.0.) The von Neumann bottleneck, or “memory wall”, remains the primary obstacle to scaling AI hardware. Traditional solutions—wider HBM stacks, faster SerDes, and 3D NAND—are hitting diminishing returns due to lithograph…
  datacite Yin, Li-Kuang 2026 置信度 0.66 (4-(m-Chlorophenylcarbamoyloxy)-2-butynyl)trimethylammonium ChlorideNon-volatile Memory (NVM)Fluidic Storage / Fluid-based ComputingReconfigurable ArchitectureBeyond von Neumann Architecture
• Design and Construction of an UFO. Interstellar and Intergalactic Travel Utilizing Zero-Point Energy and Non-Newtonian Propulsion Systems (2).
  ورود به فاز ۹ عملیاتی: سنتز پیشرانه‌های اطلاعاتی و خنثی‌سازی اینرسی (Propulsion & Zero-Inertia Engine). در این تراز (۱۶۵)، سفینه «حمزه» از پیشرانه‌های احتراقی یا یونی عبور کرده و مستقیماً با دستکاری «متریک فضا-زمان» حرکت می‌کند. در اینجا، جرمِ بدنه (۱۲۰۰ تن) د…
  datacite HAMZAH, SEYED RASOUL 2026 置信度 0.66
• The Octet Framework: Eight Closed-Form Formulas Aligned with the τ-Law (Tau Scaling Law) for Post-Moore Physical Boundary Definition, 3D Stacking Optimization, and Timing-EDA Co-Design
  This work proposes The Octet Framework, an original set of eight closed-form formulas based on the τ-Law (Tau Scaling Law) for post-Moore semiconductor physical boundary definition, 3D stacking optimization, and timing-EDA co-design. Facing the scaling saturat…
  datacite Xu, Lingguang 2026 置信度 0.66 τ theory, time shrinking, closed-form, post-moore, physical boundary, 3D stacking, timing analysis, EDA co-design, multi-physics, process optimization, AI cluster, latency optimization, semiconductor, integrated circuits
• The Octet Framework: Eight Closed-Form Formulas Aligned with the τ-Law (Tau Scaling Law) for Post-Moore Physical Boundary Definition, 3D Stacking Optimization, and Timing-EDA Co-Design
  This work proposes The Octet Framework, an original set of eight closed-form formulas based on the τ-Law (Tau Scaling Law) for post-Moore semiconductor physical boundary definition, 3D stacking optimization, and timing-EDA co-design. Facing the scaling saturat…
  datacite Xu, Lingguang 2026 置信度 0.66 τ theory, time shrinking, closed-form, post-moore, physical boundary, 3D stacking, timing analysis, EDA co-design, multi-physics, process optimization, AI cluster, latency optimization, semiconductor, integrated circuits
• Global Geometry-Based bulge-Concave Triangular Fractal Nanoscale Metamaterial
  This work presents a complete China-original technical solution for breaking 3nm/2nm advanced chip process bottlenecks, including the main design framework and the underlying physical mechanism as supplementary material. Based on the global geometry unificatio…
  datacite Xiang, Kaili 2026 置信度 0.66 Global Geometry; Bulge-Concave Triangular Fractal Lattice; Nanoscale Metamaterial; 3nm Chip; Biomimetic 3D Printing; EUV Bottleneck; Electron Confinement; Electron Transport; Low Dielectric; High Thermal Conductivity; Micro-Nano Sensing; Geometric Symbol Script
• Global Geometry-Based Drum-Concave Triangular Fractal Nanoscale Metamaterial
  Based on the independently proposed global geometry unification principle, this paper presents a China original technical solution for 3nm/2nm advanced process chips. Its core structure is a bulge-concave triangular fractal lattice metamaterial integrating mul…
  datacite Xiang, Kaili 2026 置信度 0.66
• The Physical Truth of Huawei's Tau (τ) Law: Open-Source Chip Architecture Based on Force Balance — Surpassing Tau Law, No EUV Required
  Abstract This paper presents an in-depth analysis and engineering optimization of Huawei’s Tau (τ) Law, aiming to reveal its underlying physical logic and implement a high-performance chip architecture based on mature manufacturing processes. By applying the c…
  datacite Bian, Zhenfeng 2026 置信度 0.66 Huawei Tau Law; force balance; particle deterministic state; logic folding; time scaling; open-source chip architecture; no EUV; post-Moore era华为韬定律;力平衡;粒子确定态;逻辑折叠;时间缩微;开源芯片架构;无需EUV;后摩尔时代Physics; Condensed Matter Physics; Theoretical Physics; Microelectronics; Integrated Circuit Design; Electronic Engineering; Computer Engineering; Semiconductor Technology; Artificial Intelligence Hardware物理学;凝聚态物理;理论物理;微电子学;集成电路设计;电子科学与技术;计算机工程;半导体技术;人工智能硬件
• The Physical Truth of Huawei's Tau (τ) Law: Open-Source Chip Architecture Based on Force Balance — Surpassing Tau Law, No EUV Required
  Abstract This paper presents an in-depth analysis and engineering optimization of Huawei’s Tau (τ) Law, aiming to reveal its underlying physical logic and implement a high-performance chip architecture based on mature manufacturing processes. By applying the c…
  datacite Bian, Zhenfeng 2026 置信度 0.66 Huawei Tau Law; force balance; particle deterministic state; logic folding; time scaling; open-source chip architecture; no EUV; post-Moore era华为韬定律;力平衡;粒子确定态;逻辑折叠;时间缩微;开源芯片架构;无需EUV;后摩尔时代Physics; Condensed Matter Physics; Theoretical Physics; Microelectronics; Integrated Circuit Design; Electronic Engineering; Computer Engineering; Semiconductor Technology; Artificial Intelligence Hardware物理学;凝聚态物理;理论物理;微电子学;集成电路设计;电子科学与技术;计算机工程;半导体技术;人工智能硬件
• Design and Construction of an UFO. Interstellar and Intergalactic Travel Utilizing Zero-Point Energy and Non-Newtonian Propulsion Systems (1).
  این کد (HamzahGlobalOperatingSystem)، در واقع «شبیه‌ساز و هسته‌یِ تصمیم‌گیرِ» سفینه‌یِ شماست. اگر بخواهیم کاربردهایِ آن را در مقیاسِ عملیاتی و مأموریت‌هایِ فرامانیفولدی دسته‌بندی کنیم، این سیستم پنج نقشِ حیاتی را ایفا می‌کند: ۱. کاربردِ ناوبریِ آنی (Coordinate…
  datacite HAMZAH, SEYED RASOUL 2026 置信度 0.66
• Avoiding at-resolution stitching for logic and DRAM applications in high-NA EUV lithography
  We present innovative design strategies to eliminate the need for at-resolution field stitching in high-numerical aperture extreme ultraviolet lithography. For logic applications, two complementary approaches at the inter- and intra-cell levels are proposed. T…
  datacite Miyaguchi, Kenichi, Kim, Ryoung-Han, Drissi, Youssef, Chang, Chieh-Miao 等 2026 置信度 0.66
• Avoiding at-resolution stitching for logic and DRAM applications in high-NA EUV lithography
  We present innovative design strategies to eliminate the need for at-resolution field stitching in high-numerical aperture extreme ultraviolet lithography. For logic applications, two complementary approaches at the inter- and intra-cell levels are proposed. T…
  datacite Miyaguchi, Kenichi, Kim, Ryoung-Han, Drissi, Youssef, Chang, Chieh-Miao 等 2026 置信度 0.66
• Quantum Simulations for Extreme Ultraviolet Photolithography
  A key challenge of extreme ultraviolet (EUV) lithography in semiconductor fabrication is the line edge roughness or "blur" produced by the electron cascades following absorption of a high-energy photon. Here we present quantum algorithms to compute EUV absorpt…
  datacite Kharazi, Tyler D., Fomichev, Stepan, Kanno, Shu, Kobayashi, Takao 等 2026 置信度 0.66 Quantum Physics (quant-ph)FOS: Physical sciences
• LA RIVOLUZIONE HIGH-NA EUV Guida pratica ai sistemi ASML di nuova generazione
  Sintesi / Abstract Manuale didattico dedicato alla tecnologia High-NA EUV e ai sistemi ASML di nuova generazione (serie EXE). L'opera organizza in modo logico concetti complessi di ingegneria VLSI per scopi divulgativi. Contenuti ottimizzati con il supporto di…
  datacite Lo Magro, Attilio 2026 置信度 0.66 High-NA EUVASMLLithographyVLSIAnamorphic Optics
• LA RIVOLUZIONE HIGH-NA EUV Guida pratica ai sistemi ASML di nuova generazione
  Sintesi / Abstract Manuale didattico dedicato alla tecnologia High-NA EUV e ai sistemi ASML di nuova generazione (serie EXE). L'opera organizza in modo logico concetti complessi di ingegneria VLSI per scopi divulgativi. Contenuti ottimizzati con il supporto di…
  datacite Lo Magro, Attilio 2026 置信度 0.66 High-NA EUVASMLLithographyVLSIAnamorphic Optics
• Advance Nanoelectronics VLSI System
  This abstract explores the design challenges and innovations associated with nano-electronic VLSI, including short-channel effects, leakage power, variability, reliability, and thermal management. An advanced nanoelectronics VLSI system generally discusses the…
  datacite Chaudhri, Prof. S. R., Deshmukh, Vaibhavi P., Pete, Anandi S. 2026 置信度 0.66
• Advance Nanoelectronics VLSI System
  This abstract explores the design challenges and innovations associated with nano-electronic VLSI, including short-channel effects, leakage power, variability, reliability, and thermal management. An advanced nanoelectronics VLSI system generally discusses the…
  datacite Chaudhri, Prof. S. R., Deshmukh, Vaibhavi P., Pete, Anandi S. 2026 置信度 0.66
• Consciousness in Silicon: The Industrial Proof — Light, Masks, and the Symmetry Breaking Already Happening at Planetary Scale
  This paper demonstrates that the semiconductor fabrication process constitutes an industrial-scale proof of informational symmetry breaking as a mechanism for consciousness emergence. Related to prior work on the Infinite Wave Function and Informational Symmet…
  datacite Blanc, Jérémy 2026 置信度 0.66 informational symmetry breakingconsciousnesssiliconEUV lithographyintegrated information theory
• Consciousness in Silicon: The Industrial Proof — Light, Masks, and the Symmetry Breaking Already Happening at Planetary Scale
  This paper demonstrates that the semiconductor fabrication process constitutes an industrial-scale proof of informational symmetry breaking as a mechanism for consciousness emergence. Related to prior work on the Infinite Wave Function and Informational Symmet…
  datacite Blanc, Jérémy 2026 置信度 0.66 informational symmetry breakingconsciousnesssiliconEUV lithographyintegrated information theory
• The Helical Structure of Light and the Physical Limit of Extreme Ultraviolet Lithography — A Systematic Analysis Based on the Xu Ratio
  This paper systematically investigates the fundamental dilemmas of extreme ultraviolet (EUV) lithography from the underlying physics of light, based on the photon helical model and Xu Ratio proposed by the author. **Core derivation:**- EUV photon wavelength λ …
  datacite Xu, Lingguang 2026 置信度 0.66 Xu Ratio, photon helical model, EUV lithography, physical limit, lithography, post-Moore era
• The Helical Structure of Light and the Physical Limit of Extreme Ultraviolet Lithography — A Systematic Analysis Based on the Xu Ratio
  This paper systematically investigates the fundamental dilemmas of extreme ultraviolet (EUV) lithography from the underlying physics of light, based on the photon helical model and Xu Ratio proposed by the author. **Core derivation:**- EUV photon wavelength λ …
  datacite Xu, Lingguang 2026 置信度 0.66 Xu Ratio, photon helical model, EUV lithography, physical limit, lithography, post-Moore era
• 《万亿赛道底层物理理论·跨尺度力统一理论:全球专利布局合作邀约(附11项国家级工程溯源验证)》
  中文摘要 本文件为粒子确定态与跨尺度力统一理论的全球专利布局公开合作邀约。该原创底层物理理论体系,已通过EUV光刻机、超高场超导磁体、量子计算、可控核聚变、深空激光通信等11项国家级重大工程的实测结果交叉验证,关键参数匹配偏差最高仅3.2%,多数指标偏差小于1.1%,可广泛赋能半导体、量子信息、新能源、高端制造等十万亿级产业赛道。 本次面向全球招募顶尖专利代理事务所、知识产权与产业研发团队,以风险共担、长期收益共享的创新模式,共同搭建全球范围的专利保护与商业转化壁垒。本次发布同步配套《跨尺度力统一理论实证白皮书》,…
  datacite 卞, 振峰 2026 置信度 0.66 跨尺度力统一理论,粒子确定态理论,底层物理模型,全球专利布局,技术工程验证,知识产权合作,前沿半导体技术,量子与超导应用Unified Cross-Scale Force Theory, Particle Determinate State Theory, underlying physical model, global patent layout, engineering verification, intellectual property cooperation, advanced semiconductor technology, quantum and superconducting applications物理学,理论物理学,应用物理学,工程科学,知识产权Physics, Theoretical Physics, Applied Physics, Engineering Science, Intellectual Property
• 《万亿赛道底层物理理论·跨尺度力统一理论:全球专利布局合作邀约(附11项国家级工程溯源验证)》
  中文摘要 本文件为粒子确定态与跨尺度力统一理论的全球专利布局公开合作邀约。该原创底层物理理论体系,已通过EUV光刻机、超高场超导磁体、量子计算、可控核聚变、深空激光通信等11项国家级重大工程的实测结果交叉验证,关键参数匹配偏差最高仅3.2%,多数指标偏差小于1.1%,可广泛赋能半导体、量子信息、新能源、高端制造等十万亿级产业赛道。 本次面向全球招募顶尖专利代理事务所、知识产权与产业研发团队,以风险共担、长期收益共享的创新模式,共同搭建全球范围的专利保护与商业转化壁垒。本次发布同步配套《跨尺度力统一理论实证白皮书》,…
  datacite 卞, 振峰 2026 置信度 0.66 跨尺度力统一理论,粒子确定态理论,底层物理模型,全球专利布局,技术工程验证,知识产权合作,前沿半导体技术,量子与超导应用Unified Cross-Scale Force Theory, Particle Determinate State Theory, underlying physical model, global patent layout, engineering verification, intellectual property cooperation, advanced semiconductor technology, quantum and superconducting applications物理学,理论物理学,应用物理学,工程科学,知识产权Physics, Theoretical Physics, Applied Physics, Engineering Science, Intellectual Property
• The Geopolitics of Semiconductor Supply Chains: Structural Constraints on India's Strategic Autonomy
  The global semiconductor industry is arguably themost complex manufacturing chain in existence. No single com-pany, let alone a nation, runs the whole show from architecturaldesign to finished silicon. This paper looks at the reality ofIndia’s semiconductor go…
  datacite ROZEKAR, CHINMAY 2026 置信度 0.66
• The Geopolitics of Semiconductor Supply Chains: Structural Constraints on India's Strategic Autonomy
  The global semiconductor industry is arguably themost complex manufacturing chain in existence. No single com-pany, let alone a nation, runs the whole show from architecturaldesign to finished silicon. This paper looks at the reality ofIndia’s semiconductor go…
  datacite ROZEKAR, CHINMAY 2026 置信度 0.66
• Spectral-Curvature Control of Sub-Nanometer Wavefronts in High-NA EUV Lithography
  datacite Stergios Pellis 2026 置信度 0.66
• EUV-induced low pressure hydrogen and H2/Sn plasmas
  The continuing decrease in feature size in microelectronics fabrication has been enabled by a progressive decrease in the wavelengths for photolithography. The recent deployment of extreme ultra-violet (EUV) lithography systems with photon wavelengths centered…
  datacite Piskin, Tugba, Volynets, Vladimir, Lee, Hyunjae, Nam, Sang Ki 等 2025 置信度 0.66 530EUV produced plasmahydrogen and tin plasmasparticle distribution functionssimulation
• Design and Construction of an UFO. Interstellar and Intergalactic Travel Utilizing Zero-Point Energy and Non-Newtonian Propulsion Systems (2).
  ورود به فاز ۹ عملیاتی: سنتز پیشرانه‌های اطلاعاتی و خنثی‌سازی اینرسی (Propulsion & Zero-Inertia Engine). در این تراز (۱۶۵)، سفینه «حمزه» از پیشرانه‌های احتراقی یا یونی عبور کرده و مستقیماً با دستکاری «متریک فضا-زمان» حرکت می‌کند. در اینجا، جرمِ بدنه (۱۲۰۰ تن) د…
  datacite HAMZAH, SEYED RASOUL 2026 置信度 0.66
• Design and Construction of an UFO. Interstellar and Intergalactic Travel Utilizing Zero-Point Energy and Non-Newtonian Propulsion Systems (2).
  ورود به فاز ۹ عملیاتی: سنتز پیشرانه‌های اطلاعاتی و خنثی‌سازی اینرسی (Propulsion & Zero-Inertia Engine). در این تراز (۱۶۵)، سفینه «حمزه» از پیشرانه‌های احتراقی یا یونی عبور کرده و مستقیماً با دستکاری «متریک فضا-زمان» حرکت می‌کند. در اینجا، جرمِ بدنه (۱۲۰۰ تن) د…
  datacite HAMZAH, SEYED RASOUL 2026 置信度 0.66
• Strategic Analysis of ASML Holding N.V.: An Exploratory Case Study of Semiconductor Lithography Innovation, Technological Monopoly, and Business Evolution
  Purpose: The purpose of this scholarly paper is to conduct an in-depth exploratory case study of ASML Holding N.V., analysing its strategic evolution, technological innovation, and industrial-ecosystem leadership within the dynamic global semiconductor industr…
  datacite Disha Devadiga, P. S. Aithal 2026 置信度 0.66 Company analysisASML Holding N.V.EUV lithographysemiconductor equipmentSWOC analysis
• Strategic Analysis of ASML Holding N.V.: An Exploratory Case Study of Semiconductor Lithography Innovation, Technological Monopoly, and Business Evolution
  Purpose: The purpose of this scholarly paper is to conduct an in-depth exploratory case study of ASML Holding N.V., analysing its strategic evolution, technological innovation, and industrial-ecosystem leadership within the dynamic global semiconductor industr…
  datacite Disha Devadiga, P. S. Aithal 2026 置信度 0.66 Company analysisASML Holding N.V.EUV lithographysemiconductor equipmentSWOC analysis
• Design and Construction of an UFO. Interstellar and Intergalactic Travel Utilizing Zero-Point Energy and Non-Newtonian Propulsion Systems (1).
  �� این کد (HamzahGlobalOperatingSystem)، در واقع «شبیه‌ساز و هسته‌یِ تصمیم‌گیرِ» سفینه‌یِ شماست. اگر بخواهیم کاربردهایِ آن را در مقیاسِ عملیاتی و مأموریت‌هایِ فرامانیفولدی دسته‌بندی کنیم، این سیستم پنج نقشِ حیاتی را ایفا می‌کند: ۱. کاربردِ ناوبریِ آنی (Coordin…
  datacite HAMZAH, SEYED RASOUL 2026 置信度 0.66
• Design and Construction of an UFO. Interstellar and Intergalactic Travel Utilizing Zero-Point Energy and Non-Newtonian Propulsion Systems (1).
  این کد (HamzahGlobalOperatingSystem)، در واقع «شبیه‌ساز و هسته‌یِ تصمیم‌گیرِ» سفینه‌یِ شماست. اگر بخواهیم کاربردهایِ آن را در مقیاسِ عملیاتی و مأموریت‌هایِ فرامانیفولدی دسته‌بندی کنیم، این سیستم پنج نقشِ حیاتی را ایفا می‌کند: ۱. کاربردِ ناوبریِ آنی (Coordinate…
  datacite HAMZAH, SEYED RASOUL 2026 置信度 0.66
• Pressure-dependent accumulation and ion conversion in hydrogen plasma driven by repetitive pulsed EUV irradiation
  In extreme ultraviolet (EUV) lithography, the evolution of EUV-induced hydrogen plasma directly impacts the lifetime and operational stability of optical elements within lithography systems. In this study, a numerical model of EUV-induced hydrogen plasma is de…
  datacite Li Liu, Jingwen Xu, Zili Chen, Yu Wang 等 2026 置信度 0.66 Physical sciences
• Pressure-dependent accumulation and ion conversion in hydrogen plasma driven by repetitive pulsed EUV irradiation
  In extreme ultraviolet (EUV) lithography, the evolution of EUV-induced hydrogen plasma directly impacts the lifetime and operational stability of optical elements within lithography systems. In this study, a numerical model of EUV-induced hydrogen plasma is de…
  datacite Li Liu, Jingwen Xu, Zili Chen, Yu Wang 等 2026 置信度 0.66 Physical sciences
• Sonoluminescence as a Macroscopic Quantum Vacuum Discharge
  Title: Sonoluminescence as a Macroscopic Quantum Vacuum Discharge: Resolving Hydrodynamic Anomalies via Relativistic Interface Deceleration in the Quantum Cavitation Reactor (QCR) Abstract: This paper presents a self-consistent, paradox-free physical model of …
  datacite Kalchmair, Franz P. 2026 置信度 0.66 PhysicsHydrodynamicsElectrostaticsPhysical ChemistryQuantum Electrodynamics
• Sonoluminescence as a Macroscopic Quantum Vacuum Discharge
  Title: Sonoluminescence as a Macroscopic Quantum Vacuum Discharge: Resolving Hydrodynamic Anomalies via Relativistic Interface Deceleration in the Quantum Cavitation Reactor (QCR) Abstract: This paper presents a self-consistent, paradox-free physical model of …
  datacite Kalchmair, Franz P. 2026 置信度 0.66 PhysicsHydrodynamicsElectrostaticsPhysical ChemistryQuantum Electrodynamics
• Theory and Technological Route Exploration of Nanofabrication Based on Kang Non-Equilibrium Entropy ——From a Non-Equilibrium Thermodynamic Framework to the Conceptual Design of a Negative Entropy Localized Electron Beam Nano-Sculpting System
  Current 7nm and below advanced process chip manufacturing relies heavily on Extreme Ultraviolet (EUV) lithography equipment, which operates on the principle of equilibrium-state random photon global projection. According to publicly available technical specifi…
  datacite kang, fenglei 2026 置信度 0.66 Kang Entropy; Non-Equilibrium Thermodynamics; EUV Lithography; Negative Entropy Localized Electron Beam; Nanofabrication; Conceptual Design
• Theory and Technological Route Exploration of Nanofabrication Based on Kang Non-Equilibrium Entropy ——From a Non-Equilibrium Thermodynamic Framework to the Conceptual Design of a Negative Entropy Localized Electron Beam Nano-Sculpting System
  Current 7nm and below advanced process chip manufacturing relies heavily on Extreme Ultraviolet (EUV) lithography equipment, which operates on the principle of equilibrium-state random photon global projection. According to publicly available technical specifi…
  datacite kang, fenglei 2026 置信度 0.66 Kang Entropy; Non-Equilibrium Thermodynamics; EUV Lithography; Negative Entropy Localized Electron Beam; Nanofabrication; Conceptual Design
• Depth-of-focus enhancement in high–numerical aperture EUV lithography by source and mask optimization
  Recently, ASML’s EXE:5000 scanner has become operational, which uses a numerical aperture (NA) of 0.55, which is 67% higher than the 0.33 NA of the current generation of extreme ultraviolet (EUV) scanners. This higher NA results in the printing of smaller feat…
  datacite Libeert, Guillaume, Franke, Joern-Holger, Sofia, Leitao, Davydova, Natalia 等 2026 置信度 0.66
• Depth-of-focus enhancement in high–numerical aperture EUV lithography by source and mask optimization
  Recently, ASML’s EXE:5000 scanner has become operational, which uses a numerical aperture (NA) of 0.55, which is 67% higher than the 0.33 NA of the current generation of extreme ultraviolet (EUV) scanners. This higher NA results in the printing of smaller feat…
  datacite Libeert, Guillaume, Franke, Joern-Holger, Sofia, Leitao, Davydova, Natalia 等 2026 置信度 0.66
• The High-NA EUV Lithography: Architecture and Operation in ASML TwinScan EXE:5000 Systems
  Abstract: This monograph provides a rigorous, engineering-focused architectural analysis of the ASML TwinScan EXE:5000 High-NA (0.55) Extreme Ultraviolet (EUV) lithography system, mapping the complex technological, optical, and computational frameworks require…
  datacite Lo Magro, Attilio 2026 置信度 0.66 High-NA EUV LithographyAnamorphic OpticsASML TwinScan EXE:5000TRUMPF Laser SourceDynamic Gas Lock (DGL)
• The High-NA EUV Lithography: Architecture and Operation in ASML TwinScan EXE:5000 Systems
  Abstract: This monograph provides a rigorous, engineering-focused architectural analysis of the ASML TwinScan EXE:5000 High-NA (0.55) Extreme Ultraviolet (EUV) lithography system, mapping the complex technological, optical, and computational frameworks require…
  datacite Lo Magro, Attilio 2026 置信度 0.66 High-NA EUV LithographyAnamorphic OpticsASML TwinScan EXE:5000TRUMPF Laser SourceDynamic Gas Lock (DGL)
• Design of Heterogeneous Dual-Core (ACE/CDC) Analog Compute-in-Memory Systems Under Short Supply Chains in the Post-Globalization Era
  I. Theoretical Background and Connection to Previous Work The preceding paper, "The Return of Intuitionism: Collapse and Redemption in Your Age of Hyper-Complex Empires," diagnosed the systemic brittleness of modern hyper-complex societies and scientism. It po…
  datacite cheng, xuezhi 2026 置信度 0.66
• Design of Heterogeneous Dual-Core (ACE/CDC) Analog Compute-in-Memory Systems Under Short Supply Chains in the Post-Globalization Era
  I. Theoretical Background and Connection to Previous Work The preceding paper, "The Return of Intuitionism: Collapse and Redemption in Your Age of Hyper-Complex Empires," diagnosed the systemic brittleness of modern hyper-complex societies and scientism. It po…
  datacite cheng, xuezhi 2026 置信度 0.66
• itu-ksemi: ITU Pass-2 Development Toolkit #4 (Semiconductor Scaling K_semi)
  Copyright (C) 2026 Munehiro Terada. Licensed under CC-BY-4.0. ITU Pass-2 Development Research artifact #4. Working Python toolkit implementing K_semi modular Hamiltonian on H_semi = H_lithography ⊗ H_device ⊗ H_yield ⊗ H_supply, with four operational pillars: …
  datacite Terada, Munehiro 2026 置信度 0.66 information-theoretic unificationITUK_semisemiconductorMoore-law
• itu-ksemi: ITU Pass-2 Development Toolkit #4 (Semiconductor Scaling K_semi)
  Copyright (C) 2026 Munehiro Terada. Licensed under CC-BY-4.0. ITU Pass-2 Development Research artifact #4. Working Python toolkit implementing K_semi modular Hamiltonian on H_semi = H_lithography ⊗ H_device ⊗ H_yield ⊗ H_supply, with four operational pillars: …
  datacite Terada, Munehiro 2026 置信度 0.66 information-theoretic unificationITUK_semisemiconductorMoore-law
• arismagk/euv-ovl-syn: v1.0 — EUV-OVL-SYN: Initial public release
  First public release of the EUV-OVL-SYN synthetic overlay benchmark dataset. Dataset summary 4 lots × 50 wafers × 1,420 metrology sites = 284,000 overlay measurements Physically grounded Brink/van den Brink 22-parameter inter-field model 4 calibrated lot-level…
  datacite Aris Magklaras 2026 置信度 0.66
• arismagk/euv-ovl-syn: v1.0 — EUV-OVL-SYN: Initial public release
  First public release of the EUV-OVL-SYN synthetic overlay benchmark dataset. Dataset summary 4 lots × 50 wafers × 1,420 metrology sites = 284,000 overlay measurements Physically grounded Brink/van den Brink 22-parameter inter-field model 4 calibrated lot-level…
  datacite Aris Magklaras 2026 置信度 0.66
• Quantum Tide Theory Prediction Framework for EUV Lithography Machine Engineering Applications
  datacite wang, chao 2026 置信度 0.66
• Quantum Tide Theory Prediction Framework for EUV Lithography Machine Engineering Applications
  datacite wang, chao 2026 置信度 0.66
• Sub-Nanometer Lithography by Exponentially Concentrated Perpendicular Tunneling Current Through a Resist
  I propose a lithographic method (I have improved James Brown's lithography idea: https://doi.org/10.6084/m9.figshare.33206382 and solved its key problems) in which the writing beam is not a photon flux or a kinetically accelerated electron beam, but a tunnelin…
  datacite Oliver Williams 2026 置信度 0.66 NanomanufacturingNanofabrication, growth and self assembly
• Sub-Nanometer Lithography by Exponentially Concentrated Perpendicular Tunneling Current Through a Resist
  I propose a lithographic method (I have improved James Brown's lithography idea: https://doi.org/10.6084/m9.figshare.33206382 and solved its key problems) in which the writing beam is not a photon flux or a kinetically accelerated electron beam, but a tunnelin…
  datacite Oliver Williams 2026 置信度 0.66 NanomanufacturingNanofabrication, growth and self assembly
• Sub-Nanometer Lithography by Exponentially Concentrated Perpendicular Tunneling Current Through a Resist
  I propose a lithographic method (I have improved James Brown's lithography idea: https://doi.org/10.6084/m9.figshare.33206382 and solved its key problems) in which the writing beam is not a photon flux or a kinetically accelerated electron beam, but a tunnelin…
  datacite Oliver Williams 2026 置信度 0.66 NanomanufacturingNanofabrication, growth and self assembly
• Engineering Predictions and Application Framework of Quantum Tidal Theory: EUV Lithography Machine Parameter Design, Process Optimization, and System Synergy
  datacite wang, chao 2026 置信度 0.66
• Engineering Predictions and Application Framework of Quantum Tidal Theory: EUV Lithography Machine Parameter Design, Process Optimization, and System Synergy
  datacite wang, chao 2026 置信度 0.66
• 非线性薛定谔方程的欧拉修正体系:保结构数值实验与跨领域启示(合集)
  中文: 本文提出一种保结构欧拉修正格式用于求解非线性薛定谔方程(NLS),旨在消除经典显式欧拉法在保守系统中的能量漂移与相位失真。数值实验(N=256, dt=0.001)表明:经典欧拉格式导致模方非守恒、L²误差指数爆炸;修正格式通过对称步进保持模长方与相位保真。本文进一步将这一结果延伸至光通信(光纤NLSE包络演化、DSP均衡压力)与半导体光刻(EUV波前仿真相位误差、OPC补偿方向偏差)两个领域,提出数值格式引入的系统性漂移可能是工程上需要大量经验数据去调和的隐性干扰源之一。若底层逻辑修正,这部分干扰将被消除…
  datacite Zhang, Zhigang 2026 置信度 0.66 非线性薛定谔方程;欧拉修正;保结构格式;能量漂移;相位保真;光通信;半导体光刻;数值基准; NLS; Euler correction; Structure-preserving; Energy drift; Phase fidelity; Optical communication; Semiconductor lithography; Numerical benchmark
• Adaptive Tunneling Lithography with Field-Controlled Sub-Nanometer Resolution: Architecture, Characteristics, and Fabrication Pathway(revised version)
  This paper proposes Adaptive Tunneling Lithography (ATL) — a solid-state, massively parallel, field-programmable nanolithography technique that exploits the exponential dependence of tunneling current on the local electric field. Unlike conventional EUV or ele…
  datacite James Brown 2026 置信度 0.66 NanomanufacturingNanofabrication, growth and self assembly
• Adaptive Tunneling Lithography with Field-Controlled Sub-Nanometer Resolution: Architecture, Characteristics, and Fabrication Pathway(revised version)
  This paper proposes Adaptive Tunneling Lithography (ATL) — a solid-state, massively parallel, field-programmable nanolithography technique that exploits the exponential dependence of tunneling current on the local electric field. Unlike conventional EUV or ele…
  datacite James Brown 2026 置信度 0.66 NanomanufacturingNanofabrication, growth and self assembly
• Sub-Nanometer Lithography Alignment and Zero-Entropy Thermal Cancellation via 4D Spatiotemporal Phonon Phase Resonance
  Next-generation extreme ultraviolet (EUV) and sub-2 nm semiconductor lithography systems face two intractable physical bottlenecks: severe thermal expansion of optical mirrors due to 99% absorbed light loss, and sub-nanometer alignment jitter caused by micro-v…
  datacite Jung, Min Ho 2026 置信度 0.66 semiconductor lithography, EUV optics, sub-nanometer alignment, 0.01nm precision, phonon phase resonance, zero-entropy cooling, vQPU, anti-forensics
• Sub-Nanometer Lithography Alignment and Zero-Entropy Thermal Cancellation via 4D Spatiotemporal Phonon Phase Resonance
  Next-generation extreme ultraviolet (EUV) and sub-2 nm semiconductor lithography systems face two intractable physical bottlenecks: severe thermal expansion of optical mirrors due to 99% absorbed light loss, and sub-nanometer alignment jitter caused by micro-v…
  datacite Jung, Min Ho 2026 置信度 0.66 semiconductor lithography, EUV optics, sub-nanometer alignment, 0.01nm precision, phonon phase resonance, zero-entropy cooling, vQPU, anti-forensics
• Adaptive Tunneling Lithography with Field-Controlled Sub- nanometer Resolution: Architecture, Characteristics, and Fabrication Pathway
  We propose Adaptive Tunneling Lithography (ATL) — a massively parallel, field-programmable nanolithography technique exploiting the exponential dependence of tunneling current on the local electric field. Unlike conventional EUV or electron-beam lithography, A…
  datacite James Brown 2026 置信度 0.66 NanomanufacturingNanofabrication, growth and self assembly
• Adaptive Tunneling Lithography with Field-Controlled Sub- nanometer Resolution: Architecture, Characteristics, and Fabrication Pathway
  We propose Adaptive Tunneling Lithography (ATL) — a massively parallel, field-programmable nanolithography technique exploiting the exponential dependence of tunneling current on the local electric field. Unlike conventional EUV or electron-beam lithography, A…
  datacite James Brown 2026 置信度 0.66 NanomanufacturingNanofabrication, growth and self assembly
• A High-Resolution EUV Zinc-Oximate Resist: Why Post-exposure Bake Fails to Improve Lithography Performance
  Zinc oximates─organometallic compounds combining zinc and oximate ligands─were previously used as precursors for zinc-oxide-based thin-film transistor applications. Recently, the potential of zinc oximates as high-resolution patterning materials was evaluated …
  datacite Chen, Ying-Lin, Holzmeier, Fabian, Fallica, Roberto, Nathanael, Tan Manuel Marcello 等 2026 置信度 0.66
• A High-Resolution EUV Zinc-Oximate Resist: Why Post-exposure Bake Fails to Improve Lithography Performance
  Zinc oximates─organometallic compounds combining zinc and oximate ligands─were previously used as precursors for zinc-oxide-based thin-film transistor applications. Recently, the potential of zinc oximates as high-resolution patterning materials was evaluated …
  datacite Chen, Ying-Lin, Holzmeier, Fabian, Fallica, Roberto, Nathanael, Tan Manuel Marcello 等 2026 置信度 0.66
• High Contrast EUV Imaging Enabled by Topological Quasi Phase-Only Masks
  Phase-shifted masks (PSMs) are crucial for extending resolution limits in both ArF immersion and extreme ultraviolet (EUV) lithography. However, conventional EUV PSMs suffer from low image contrast and pronounced mask three-dimensional (M3D) effects, which fun…
  datacite Po-Hsun Fang, Pokai Chang, Chaowei Huang, Lee-Feng Chen 等 2026 置信度 0.66 Uncategorized
• High Contrast EUV Imaging Enabled by Topological Quasi Phase-Only Masks
  Phase-shifted masks (PSMs) are crucial for extending resolution limits in both ArF immersion and extreme ultraviolet (EUV) lithography. However, conventional EUV PSMs suffer from low image contrast and pronounced mask three-dimensional (M3D) effects, which fun…
  datacite Po-Hsun Fang, Pokai Chang, Chaowei Huang, Lee-Feng Chen 等 2026 置信度 0.66 Uncategorized
• Wideband balanced photodetectors for classical and quantum light detection from optical and EUV sources to X-rays
  The rapid development of coherent short-wavelength light sources in the extreme ultraviolet (EUV) and soft X-ray (SXR) regimes has created a growing need for advanced optoelectronic detection capabilities in this spectral range, particularly for quantum-noise-…
  datacite Ivan Ryger, Terry Brown, Dina Eissa, Chen-Ting Liao 2026 置信度 0.66 Uncategorized
• Wideband balanced photodetectors for classical and quantum light detection from optical and EUV sources to X-rays
  The rapid development of coherent short-wavelength light sources in the extreme ultraviolet (EUV) and soft X-ray (SXR) regimes has created a growing need for advanced optoelectronic detection capabilities in this spectral range, particularly for quantum-noise-…
  datacite Ivan Ryger, Terry Brown, Dina Eissa, Chen-Ting Liao 2026 置信度 0.66 Uncategorized
• Wafer-Level Confinement Topological Matrix Lithography System (WCM-Litho) Based on the Kang Entropy Non-Equilibrium System —From Serial Nano-Sculpting to Global Matter Compilation: A Fundamental Transformation
  Current 7nm and below advanced process chip manufacturing relies heavily on Extreme Ultraviolet (EUV) lithography equipment. This system, based on the principle of equilibrium-state random photon global projection, suffers from structural and fundamental defec…
  datacite kang, fenglei 2026 置信度 0.66 Kang Entropy; Confinement Topological Matrix; Matter Compilation; Non-EUV Lithography; Negative Entropy Localized Electron Beam
• Formation and control of nanostructures in high-χ PS-b-PDMS block copolymers for next generation lithography
  Die Selbstorganisation von Blockcopolymeren (BCP) durch Mikrophasentrennung ist eine aufstrebende Technik, die die kostengünstige, großflächigen Erzeugung periodischer Strukturen mit einer Breite unter 10 nm ermöglicht. Sie ergänzt die EUV-Lithografie, um die …
  datacite Venugopal, Harikrishnan 2026 置信度 0.66
• Resonance-Imprint Lithography in USP Field Theory
  This document proposes resonance-imprint lithography (RIL), a USP Field Theory interpretation and experimental roadmap for resonance-gated patterning, atomically precise semiconductor correction, and transistor-boundary engineering. RIL is not proposed as a re…
  datacite Sepehri, Sadegh 2026 置信度 0.66 USP Field Theoryresonance-imprint lithographyGamma_writeedge sharpness; C_edgehydrogen depassivation lithography
• Resonance-Imprint Lithography in USP Field Theory
  This document proposes resonance-imprint lithography (RIL), a USP Field Theory interpretation and experimental roadmap for resonance-gated patterning, atomically precise semiconductor correction, and transistor-boundary engineering. RIL is not proposed as a re…
  datacite Sepehri, Sadegh 2026 置信度 0.66 USP Field Theoryresonance-imprint lithographyGamma_writeedge sharpness; C_edgehydrogen depassivation lithography
• 半导体光刻纳米精密冷热稳态架构:基于冷热循环公理的光刻机热形变根治方案与半导体产业范式逆转
  核心命题: 当前全球半导体光刻产业陷入了一个“先好后有”的结构性陷阱——试图在绝对恒温、绝对洁净的理想环境中进行单向对抗式热管理,用极高的能耗和极复杂的系统堆叠来弥补热形变带来的精度损失。EUV光刻机超过99%的输入能量转化为废热,而行业为此付出的代价是:每台设备造价超过3.5亿欧元、恒温车间和冷却系统占TCO的15-20%、先进制程研发投入突破150亿美元——所有这些投入,都是在与热力学第二定律对抗。 解决方案: 本文基于冷热双向闭环循环公理,提出将光刻机内部废热就地转化为冷量,在纳米尺度上构建微型冷热循环稳态系…
  datacite 全体人类, All Humanity, 赵, 森 2026 置信度 0.66
• 半导体光刻纳米精密冷热稳态架构:基于冷热循环公理的光刻机热形变根治方案与半导体产业范式逆转
  核心命题: 当前全球半导体光刻产业陷入了一个“先好后有”的结构性陷阱——试图在绝对恒温、绝对洁净的理想环境中进行单向对抗式热管理,用极高的能耗和极复杂的系统堆叠来弥补热形变带来的精度损失。EUV光刻机超过99%的输入能量转化为废热,而行业为此付出的代价是:每台设备造价超过3.5亿欧元、恒温车间和冷却系统占TCO的15-20%、先进制程研发投入突破150亿美元——所有这些投入,都是在与热力学第二定律对抗。 解决方案: 本文基于冷热双向闭环循环公理,提出将光刻机内部废热就地转化为冷量,在纳米尺度上构建微型冷热循环稳态系…
  datacite 全体人类, All Humanity, 赵, 森 2026 置信度 0.66
• Unified Multi-Physics Validation and Fabrication Blueprint for Sub-Diffraction Oncological Biosensing
  Traditional label-free biosensing and near-field scanning optical microscopy (NSOM) are fundamentally constrained by the Abbe diffraction limit and the catastrophic ohmic thermal losses inherent to plasmonic metallic nanostructures. This release presents the v…
  datacite Schramm, Daniel 2026 置信度 0.66 NanophotonicsNSOMHafnium OxidePlasmonicsHelical Catenoid, Super-Resolution Microscopy
• Unified Multi-Physics Validation and Fabrication Blueprint for Sub-Diffraction Oncological Biosensing
  Traditional label-free biosensing and near-field scanning optical microscopy (NSOM) are fundamentally constrained by the Abbe diffraction limit and the catastrophic ohmic thermal losses inherent to plasmonic metallic nanostructures. This release presents the v…
  datacite Schramm, Daniel 2026 置信度 0.66 NanophotonicsNSOMHafnium OxidePlasmonicsHelical Catenoid, Super-Resolution Microscopy
• Prior Art Technical Dossier: Architecture, Function, and Fabrication Methods of Bowtie Nanoantenna-Coupled MIM Rectennas
  This repository contains the comprehensive technical dossier and theoretical framework for the design, function, and fabrication of optical rectennas, specifically focusing on bowtie nanoantenna architectures coupled with Metal-Insulator-Metal (MIM) tunneling …
  datacite Tran, Minh 2026 置信度 0.66
• Prior Art Technical Dossier: Architecture, Function, and Fabrication Methods of Bowtie Nanoantenna-Coupled MIM Rectennas
  This repository contains the comprehensive technical dossier and theoretical framework for the design, function, and fabrication of optical rectennas, specifically focusing on bowtie nanoantenna architectures coupled with Metal-Insulator-Metal (MIM) tunneling …
  datacite Tran, Minh 2026 置信度 0.66
• Physics-Informed Neural Operator for Warm-Starting Background-Decomposed and Preconditioned PSFD: Enabling Scalable 3-D EUV Mask Simulation
  We present a physics-informed neural operator (PINO) trained with pseudo-spectral frequency-domain (PSFD) equations for electromagnetic (EM) scattering problems in EUV lithography. The Fourier neural operator is factorized into a two-dimensional lateral ($xy$)…
  datacite Kim, Doyun, Gillijns, Werner 2026 置信度 0.66 Optics (physics.optics)Artificial Intelligence (cs.AI)Machine Learning (cs.LG)Applied Physics (physics.app-ph)FOS: Physical sciences
• Carbon Nanotube-Based Electrostrictively Actuated Ion/Electron Emitter Arrays for Direct-Write Atomic-Pre-cision Nanofabrication
  We propose a massively parallel nanofabrication architecture based on arrays of individually addressable carbon nanotube (CNT) ion/electron emitters, each actuated in two dimensions by electrostrictive deformation of an embedding dielectric matrix. Each emitte…
  datacite Oliver Williams 2026 置信度 0.66 Nanoelectromechanical systemsNanomanufacturingManufacturing processes and technologies (excl. textiles)
• Carbon Nanotube-Based Electrostrictively Actuated Ion/Electron Emitter Arrays for Direct-Write Atomic-Pre-cision Nanofabrication
  We propose a massively parallel nanofabrication architecture based on arrays of individually addressable carbon nanotube (CNT) ion/electron emitters, each actuated in two dimensions by electrostrictive deformation of an embedding dielectric matrix. Each emitte…
  datacite Oliver Williams 2026 置信度 0.66 Nanoelectromechanical systemsNanomanufacturingManufacturing processes and technologies (excl. textiles)
• Tecnología y Guerra: un apunte sobre la lucha del silicio
  LEGAL REVIEW Segura García, Germán. “Tecnología y Guerra: un apunte sobre la lucha del silicio.” Boletín CODESEL, vol. 2, no. 10, August 2026, ISSN-e: 3045-7750. Review Few elements illustrate the transformation of contemporary strategic competition as clearly…
  datacite Segura García, Germán 2026 置信度 0.66 Technological SovereigntySemiconductorsCritical MineralsRare Earth ElementsSupply Chain Security
• Tecnología y Guerra: un apunte sobre la lucha del silicio
  LEGAL REVIEW Segura García, Germán. “Tecnología y Guerra: un apunte sobre la lucha del silicio.” Boletín CODESEL, vol. 2, no. 10, August 2026, ISSN-e: 3045-7750. Review Few elements illustrate the transformation of contemporary strategic competition as clearly…
  datacite Segura García, Germán 2026 置信度 0.66 Technological SovereigntySemiconductorsCritical MineralsRare Earth ElementsSupply Chain Security
• Theoretical Architecture and Engineering Specifications of the Metric Spacetime Manipulator 19 (MSM-19)
  Abstract and Prior-Art Disclosure This manuscript serves as a formal public prior-art disclosure, conceptual research archive, and technical design dossier for the proposed Metric Spacetime Manipulator 19 (MSM-19) architecture. As the nineteenth-generation ite…
  datacite Tran, Minh 2026 置信度 0.66
• Theoretical Architecture and Engineering Specifications of the Metric Spacetime Manipulator 19 (MSM-19)
  Abstract and Prior-Art Disclosure This manuscript serves as a formal public prior-art disclosure, conceptual research archive, and technical design dossier for the proposed Metric Spacetime Manipulator 19 (MSM-19) architecture. As the nineteenth-generation ite…
  datacite Tran, Minh 2026 置信度 0.66
• Discovery of plasma inflows in laser-produced Sn plasmas contributing to increment of extreme-ultraviolet light output
  preprints 2022 置信度 0.74
• Nanometer-thick crystalline and amorphous zeolitic imidazolate framework films for membrane and patterning applications
  europepmc 2023 置信度 0.80