-
Organic semiconductors have been implemented in a variety of electronic devices ranging from organic light-emitting diodes, organic photovoltaic devices, and organic transistors. In all of these devices, the efficient injection and/or extraction of charges acr…
datacite
Borchert, James W.
2020
置信度 0.73
540
-
Die kontinuierliche Miniaturisierung von Silizium-basierter Technologie, ermöglicht und getrieben durch das Mooresche Gesetz, ist weiterhin ein wichtiger Bestandteil der International Roadmap for Devices and Systems (IRDS). Die aktuell in modernen Smartphones …
datacite
Jech, Markus
2020
置信度 0.76
BauelementzuverlässigkeitDegradation durch heiße LadungsträgerNichtgleichgewichts SpannungstemperatureinstabilitätDichtefunktionaltheorieMOSFET
-
Recent years have shown a growing interest in device concepts based on quantum mechanical tunneling. The tunneling field effect transistor (TFET) is a device that competes directly with the metal-oxide-semiconductor field effect transistor (MOSFET) in terms of…
datacite
Rolseth, Erlend Granbo
2017
置信度 0.72
621.3
-
Spin-orbit gap feature in energy dispersion of one-dimensional devices is revealed via strong spin-orbit interaction (SOI) effects under Zeeman field. We describe the utilization of a finger-gate or a top-gate to control the spin-dependent transport characteri…
datacite
Yun-Hsuan Yu, Chi-Shung Tang, Nzar Rauf Abdullah, Gudmundsson, Vidar
2018
置信度 0.73
Spin-orbitZeemantop-gatefinger-gatebound state.
-
Spin-orbit gap feature in energy dispersion of one-dimensional devices is revealed via strong spin-orbit interaction (SOI) effects under Zeeman field. We describe the utilization of a finger-gate or a top-gate to control the spin-dependent transport characteri…
datacite
Yun-Hsuan Yu, Chi-Shung Tang, Nzar Rauf Abdullah, Gudmundsson, Vidar
2018
置信度 0.73
Spin-orbitZeemantop-gatefinger-gatebound state.
-
In this paper, we present a vertical nanowire thin film transistor with gate-all-around architecture, fabricated using CMOS compatible processes. A novel method of fabricating polysilicon vertical nanowires of diameter as small as 30 nm using wet-etch is prese…
datacite
N. Shen, T. T. Le, H. Y. Yu, Z. X. Chen 等
2011
置信度 0.73
Nanowire (NW)Gate-all-around (GAA)polysilicon (poly-Si)thin-film transistor (TFT).
-
In this paper, we present a vertical nanowire thin film transistor with gate-all-around architecture, fabricated using CMOS compatible processes. A novel method of fabricating polysilicon vertical nanowires of diameter as small as 30 nm using wet-etch is prese…
datacite
N. Shen, T. T. Le, H. Y. Yu, Z. X. Chen 等
2011
置信度 0.73
Nanowire (NW)Gate-all-around (GAA)polysilicon (poly-Si)thin-film transistor (TFT).
-
In this paper, we present a vertical wire NMOS device fabricated using CMOS compatible processes. The impact of temperature on various device parameters is investigated in view of usual increase in surrounding temperature with device density.
datacite
N. Shen, Z. X. Chen, K.D. Buddharaju, H. M. Chua 等
2010
置信度 0.69
Gate-all-aroundtemperature dependencesilicon nanowire
-
In this paper, we present a vertical wire NMOS device fabricated using CMOS compatible processes. The impact of temperature on various device parameters is investigated in view of usual increase in surrounding temperature with device density.
datacite
N. Shen, Z. X. Chen, K.D. Buddharaju, H. M. Chua 等
2010
置信度 0.69
Gate-all-aroundtemperature dependencesilicon nanowire
-
crossref
Masaharu Kobayashi, Anlan-Chen, Ki-Woong Park, Kota Sakai 等
2026-05-06T19:38:04Z
置信度 0.66
-
Abstract This paper proposes a design of gate all around CNTFET based ternary content addressable memory (TCAM). TCAM cell is designed and simulated in HSPICE using top gated CNTFET (TG-CNTFET) & gate all around CNTTFET (GAA-CNTFET). Dual chirality techniq…
crossref
Sabzar Shafi Ganie, Amandeep Singh
2022-04-26T18:59:28Z
置信度 0.79
pharmacologyeess.syperovskitephysics.app-phgenetics
-
crossref
Md. Mohsinur Rahman Adnan, Md Samzid Bin Hafiz, Nujhat Tasneem, Quazi D.M. Khosru
2017-01-05T17:56:11Z
置信度 0.63
-
crossref
Yogesh Pratap, Manoj Kumar, Sneha Kabra, Subhasis Haldar 等
2017-08-04T10:13:21Z
置信度 0.63
-
crossref
Boram Yi, Yeong-Hun Park, Ji-Woon Yang
2019-11-27T19:38:03Z
置信度 0.64
-
crossref
Rakhi Narang, Manoj Saxena, R. S. Gupta, Mridula Gupta
2012-11-13T19:56:34Z
置信度 0.63
-
crossref
Java Madan, Rishu Chaujar
2016-10-20T20:51:50Z
置信度 0.63
-
crossref
Siddharth Mokkapati, Nivedita Jaiswal, Manish Gupta, Abhinav Kranti
2019-03-05T20:44:44Z
置信度 0.64
-
crossref
C. Usha, P. Vimala, K. Ramkumar, V. N. Ramakrishnan
2022-01-03T00:03:15Z
置信度 0.64
-
Poly-crystalline silicon channel transistors have been used as a display TFT for a long time and have recently been used in a 3D vertical NAND Flash which is a transistor with 2D plane NAND upright. In addition, multi-gate transistors such as FinFETs and a gat…
crossref
Yoongeun Seon, Jongmin Kim, Soowon Kim, Jongwook Jeon
2019-09-05T03:22:36Z
置信度 0.79
physics.app-phelectrical engineering, electronic engineering, information engineeringcs.itsemiconductorcond-mat.mes-hall
-
crossref
B. Srujana, D. Jayanthi, Raji Krishna, D.S. Shylusam
2024-04-27T11:04:40Z
置信度 0.66
-
crossref
Amir Hossein Bayani, Jan Voves, Daryoosh Dideban
2017-12-09T08:30:47Z
置信度 0.63
-
crossref
Wenxuan Zang, Yanbin Yang, Wenchao Chen
2023-01-30T20:14:46Z
置信度 0.64
-
crossref
Shreyas Kulkarni, Sangeeta Joshi, Dattatray Bade, Subha Subramaniam
2018-09-12T14:15:23Z
置信度 0.63
-
crossref
2026-06-10T06:00:36Z
置信度 0.66
-
crossref
2023-12-28T15:00:16Z
置信度 0.64
-
Fabrication et caractérisation de transistors MOS à base de nanofils de silicium empilés et à grille enrobante réalisés par approche Gate-Last pour les noeuds technologiques sub-7 nm. La diminution de la taille des transistors actuellement utilisés en microéle…
crossref
Loic Gaben
2026-04-02T15:53:23Z
置信度 0.82
philosophypolitical sciencecondensed matter physicsinformation theoryai governance
-
crossref
Tetsufumi Tanamoto, Keiji Ono
2026-03-25T19:57:30Z
置信度 0.66
-
crossref
2020-04-09T09:30:40Z
置信度 0.64
-
crossref
Leo Raj Solay, Pradeep Kumar, Intekhab Amin, Sunny Anand
2021-05-11T00:50:04Z
置信度 0.64
-
crossref
Weijie Wei, Weifeng Lü, Ying Han, Caiyun Zhang 等
2024-02-08T17:04:43Z
置信度 0.66
-
crossref
Yumin Xu, Chunlei Wu, Boqian Shen, Fei Zhao 等
2024-05-22T17:32:27Z
置信度 0.66
-
Recently, in accordance with the demand for development of low-power semiconductor devices, a negative capacitance field-effect-transistor (NC-FET) that integrates ferroelectric material into a gate stack and utilizes negative capacitive behavior has been wide…
crossref
Yeji Kim, Yoongeun Seon, Soowon Kim, Jongmin Kim 等
2021-05-14T10:54:22Z
置信度 0.79
materials sciencephysics.app-phphysicselectrical engineering, electronic engineering, information engineeringcond-mat.mes-hall
-
crossref
Vidyadhar Gupta, Vedvrat, Abhinav Gupta, Amit Kumar Pandey 等
2025-09-16T14:59:17Z
置信度 0.66
-
Abstract Junctionless p-type polycrystalline silicon (poly-Si) nanowire (NW) transistor with ideal subthreshold slope (SS) is successfully demonstrated by a gate-all-around channel structure and improved fabrication processes with highly suppressed grain bound…
crossref
Min-Ju Ahn, Takuya Saraya, Masaharu Kobayashi, Naomi Sawamoto 等
2020-06-19T18:15:14Z
置信度 0.79
materials scienceoptoelectronicssemiconductorquantum dotperovskite
-
In this manuscript, a comprehensive analytical model has been formulated for the Channel Engineered-Macaroni Induced (CE-MI) Gate All Around Field Effect Transistor (GAA FET), aimed at addressing the issue of OFF-state leakage current, specifically gate-induce…
crossref
Aapurva Kaul, Sonam Rewari, Deva Nand
2025-09-22T22:50:26Z
置信度 0.82
materials scienceoptoelectronicsperovskitesemiconductorphysics.app-ph
-
crossref
Maissa Belkhiria, Haifa A. Alyousef, Hanen Chehimi, Fatma Aouaini 等
2022-08-03T02:06:32Z
置信度 0.64
-
crossref
Nithin NR Kumar, Ajay Sudhir Bale, Jayanth S, Kotapothula Anil Kumar 等
2023-05-30T17:17:45Z
置信度 0.64
-
crossref
Aditya Sinha, Nishant Choudhary
2025-09-26T22:22:29Z
置信度 0.66
-
crossref
Shujun Ye, Kikuo Yamabe, Tetsuo Endoh
2021-07-01T19:52:28Z
置信度 0.64
-
crossref
Jae Hwa Seo, Young Jun Yoon, Jung-Hee Lee, In Man Kang
2017-08-13T03:02:26Z
置信度 0.63
-
In this paper, we study the impact of a local high- k gate insulator on the drivability and off-current of a gate-all-around (GAA) silicon-on-insulator (SOI) metal–oxide–semiconductor field-effect transistor (MOSFET). The replacement of part of the gate SiO 2 …
crossref
Yasuhisa Omura, Osanori Hayashi, Shunsuke Nakano
2010-04-20T01:57:52Z
置信度 0.75
climatologytopological insulatorcond-mat.mes-hallphysics.app-phmarine engineering
-
crossref
Shankaranand Jha, Santosh Kumar Choudhary
2019-07-25T19:47:28Z
置信度 0.64
-
crossref
Manish Kumar Rai, Sanjeev Rai, Abhinav Gupta
2020-10-14T19:03:06Z
置信度 0.64
-
crossref
Manish Kumar Rai, Satyajeet Sahoo, Satya Sri Prabhas Routh, Satyanarayana Karumuri 等
2026-03-02T20:52:26Z
置信度 0.66
-
Abstract For some time now, the advancement of low power and high sensitivity biosensors has been the center of attention for in-situ detection and monitoring which form an integral part of portable health monitoring systems. This paper elucidates the design-o…
crossref
Sanjana Tiwari, Arya Dutt, Mayuresh Joshi, Prakhar Nigam 等
2021-07-23T17:10:39Z
置信度 0.79
materials sciencephysics.app-phphysical sciencesquantum dotgraphene
-
Gate-all-around silicon nanowire transistor (SNWT) can be considered as the potential candidate for highly scaled devices. This paper mainly discusses a new process integration scheme, which features bulk substrate based, epi-free integration, self-aligned str…
crossref
Ru Huang, Runsheng Wang, Yu Tian, Jing Zhuge 等
2009-07-13T22:26:46Z
置信度 0.75
materials sciencecond-mat.mtrl-scicond-mat.mes-hallcondensed matter physicsoptoelectronics
-
crossref
2024-05-09T15:50:12Z
置信度 0.66
-
crossref
2021-07-01T11:48:40Z
置信度 0.64
-
crossref
Guoyan Zhang, Aihua Dong, Nie Liu, Rui Tian 等
2015-03-17T23:14:30Z
置信度 0.63
-
crossref
Jae Hwa Seo, Young Jun Yoon, In Man Kang
2018-04-20T00:37:10Z
置信度 0.63
-
crossref
Jean-Pierre Colinge
2008-05-15T10:57:32Z
置信度 0.61
-
crossref
B. Iñiguez
2005-08-24T22:14:26Z
置信度 0.61
-
crossref
2026-03-23T16:21:30Z
置信度 0.66
-
crossref
Miaomiao Wang, Jingyun Zhang, Huimei Zhou, Richard G. Southwick 等
2019-05-24T04:11:10Z
置信度 0.64
-
crossref
Maryam Ziaei-Moayyed, Murat Okandan
2012-03-01T11:33:32Z
置信度 0.63
-
crossref
2025-09-09T01:00:11Z
置信度 0.66
-
crossref
2024-09-27T07:22:22Z
置信度 0.66
-
crossref
Geetha Amrutha Mandalapu, Rupa Kasireddy, Amandeep Singh
2026-01-19T20:51:22Z
置信度 0.66
-
Abstract In this paper we have performed scaling performance of asymmetric junctionless (JL) SOI nanowire FET at 10 nm gate length ( L G ). To study the device electrical performance various DC metrics like SS, DIBL, I ON / I OFF ratio are performed. Even at 5…
crossref
Bharath Sreenivasulu Vakkalak, Vadthiya Narendar
2021-11-01T17:06:02Z
置信度 0.79
materials sciencephysics.app-phsemiconductorcond-mat.mes-hallphysical sciences
-
The analog/RF performance of gate-all-around nanosheet field-effect transistor (GAA NSFET) with spacer dielectric engineering is investigated using three-dimensional TCAD tool. The analog/RF figures of merit of the proposed GAA NSFET, including the intrinsic g…
crossref
Lakshmana Chandana, Subba Rao Suddapalli
2026-05-11T14:06:32Z
置信度 0.82
materials sciencephysical sciencescomputer and information scienceselectrical engineering, electronic engineering, information engineeringinformation theory
-
crossref
Stuart Thomas
2020-12-11T17:04:57Z
置信度 0.64
-
crossref
Zhaoyi Kang, Liangliang Zhang, Runsheng Wang, Ru Huang
2009-09-03T03:13:48Z
置信度 0.61
-
Introduction All major integrated device manufacturers have introduced Gate All Around Nanosheet Field Effect Transistors (GAA NSFETs) as the next generation technology for CMOS applications. The design of GAA NSFETs is similar to Silicon-On-Insulator (SOI) te…
crossref
2025-07-22T16:37:26Z
置信度 0.82
materials sciencephysical sciencesphysicscomputer scienceoptoelectronics
-
crossref
Ming-Hung Han, Chun-Yen Chang, Yi-Ruei Jhan, Jia-Jiun Wu 等
2013-01-02T19:00:43Z
置信度 0.63
-
crossref
Sanjana Tiwari, Arya Dutt, Mayuresh Joshi, Prakhar Nigam 等
2021-07-05T09:02:55Z
置信度 0.64
-
Single‐gate metal‐oxide‐semiconductor field‐effect transistors (MOSFET) suffer from several basic physical and electrical limitations for further scaling in deep nanoscale domains, which are often known as short‐channel and reliability effects. The junctionles…
crossref
Ibrahim Rahmani, Hichem Ferhati, Zohir Dibi, Faycal Djeffal
2025-06-28T03:09:59Z
置信度 0.82
electrical engineering, electronic engineering, information engineeringphysical sciencesmaterials scienceengineeringphysics.app-ph
-
crossref
Qi Yan, Hua Shao, Junjie Li, Zhenzhen Kong 等
2023-05-01T13:26:51Z
置信度 0.64
-
crossref
Jae Hwa Seo, Young Jun Yoon, Ra Hee Kwon, Young In Jang 等
2016-03-28T21:06:26Z
置信度 0.63
-
crossref
Ryoongbin Lee, Suhyeon Kim, Sangwan Kim, Sihyun Kim 等
2018-04-06T00:22:40Z
置信度 0.63
-
Gate-All-Around Field-Effect Transistors (GAAFETs), now entering high-volume production as successors to fin field-effect transistor technology, are enabling continued scaling and enhanced performance in advanced semiconductor nodes. However, the drain-current…
crossref
Juan P. Mendez, Coleman Cariker, Michael Titze, Alex A. Belianinov 等
2025-12-09T22:42:37Z
置信度 0.82
materials sciencecond-mat.mtrl-scicond-mat.mes-hallphysics.app-phoptoelectronics
-
crossref
Nurul Ezaila Alias, Mohammed Adamu Sule, Michael Loong Peng Tan, Afiq Hamzah 等
2020-08-14T20:51:51Z
置信度 0.64
-
crossref
Madhulika Korde, Sonal Dey, Alain Diebold, Nick Keller
2018-03-19T18:13:34Z
置信度 0.63
-
Abstract High‐quality liquid gate‐all‐around (LGAA) silicon nanowire (NW) field‐effect transistor (FET) biosensors are fabricated and studied their properties in 1 m m phosphate‐buffered saline solution with pH = 7.4 using transport and noise spectroscopy. At …
crossref
Yongqiang Zhang, Nazarii Boichuk, Denys Pustovyi, Valeriia Chekubasheva 等
2024-04-01T03:20:45Z
置信度 0.82
materials sciencephysics.app-phcond-mat.mes-hallphysicsmeteorite
-
crossref
Xingqi Zou, Lei Jin, Dandan Jiang, Yu Zhang 等
2018-02-19T23:37:02Z
置信度 0.63
-
crossref
Wei-Ren Chen, Dun-Bao Ruan, Kuei-Shu Chang-Liao, Hao-Yan Wang 等
2023-07-21T17:21:52Z
置信度 0.64
-
Abstract In this paper, we have proposed a 2D analytical model for Asymmetric gate stack triple metal gate MOSFET(AGSTMGAAFET) and performed a comparative analysis with the simulation results obtained using the SILVACO 3D simulation software. Existing devices …
crossref
Arvind Ganesh, Kshitij Goel, Jaskeerat Singh Mayall, Sonam Rewari
2021-04-12T13:54:54Z
置信度 0.79
materials sciencephysics.app-phsemiconductorelectrical engineering, electronic engineering, information engineeringeess.sp
-
crossref
Hee Bum Roh, Jae Hwa Seo, Young Jun Yoon, Jin-Hyuk Bae 等
2014-11-28T16:15:10Z
置信度 0.63
-
crossref
R.K. Lawrence, J.P. Colinge, H.L. Hughes
2002-12-09T23:24:26Z
置信度 0.61
-
crossref
2014-07-26T02:25:36Z
置信度 0.63
-
crossref
Weijie Lu
2020-10-28T06:55:20Z
置信度 0.64
-
Transistors nanométriques à grille entourante sur canal vertical en silicium : fabrication, caractérisation et développement de portes logiques standards La taille des données et les exigences en matière de fonctionnalité pour l'informatique ne cessent d'augme…
crossref
Abhishek Kumar
2026-04-07T14:30:39Z
置信度 0.76
-
crossref
Zhihong Chen
2022-12-12T17:06:28Z
置信度 0.64
-
crossref
Nathan Totorica, Wei Hu, Feng Li
2023-08-14T12:48:49Z
置信度 0.64
-
This work presents a numerical simulation study of short channel effect (SCE) in new hemispherical gate-all-around (HGAA) MOS devices. These new HGAA architectures allow optimizing the gate electrostatic control of simple GAA MOS devices after rounding their c…
crossref
Francis Balestra, Gerard Ghibaudo
2026-05-20T01:23:37Z
置信度 0.82
electrical engineering, electronic engineering, information engineeringphysicsmaterials sciencecond-mat.mes-hallcond-mat.mtrl-sci
-
crossref
Richa Gupta, Devi Dass, Rakesh Prasher, Rakesh Vaid
2013-11-27T10:52:40Z
置信度 0.63
-
crossref
Raj Sambhav, Yogesh Pratap
2025-06-11T00:20:52Z
置信度 0.66
-
crossref
Leo Raj Solay, S. Intekhab Amin, Pradeep Kumar, Sunny Anand
2021-11-11T08:02:45Z
置信度 0.64
-
crossref
Dheeraj Sharma, Santosh Kumar Vishvakarma
2013-10-29T23:20:35Z
置信度 0.63
-
crossref
Kiwon Song, Sangwoo Lim
2026-03-09T09:52:47Z
置信度 0.66
-
crossref
KaiMin Feng, HaoYan Liu, HuaiZhi Luo, Xi Zhang 等
2025-06-03T17:42:31Z
置信度 0.66
-
Abstract not Available.
crossref
Quazi D. M. Khosru, Saeed Uz Zaman Khan, Md. Shafayat Hossain, Fahim Ur Rahman 等
2020-02-27T00:29:14Z
置信度 0.64
-
Abstract The Gate‐All‐Around Field‐Effect Transistor (GAAFET) is proposed as a successor to Fin Field‐Effect Transistor (FinFET) technology to increase channel length and improve the device performance. The GAAFET features a complex multilayer structure, which…
crossref
Ziyi Hu, Junjie Li, Rui Chen, Dashan Shang 等
2024-10-11T04:39:40Z
置信度 0.82
control theoryadsorptioncryptography and securitychemical engineeringmaterials science
-
crossref
Po-Jui Lin, Yung-Yueh Chiu, Frederick Chen, Riichiro Shirota
2021-02-23T20:49:35Z
置信度 0.64
-
This work demonstrates a self-consistent 2-D numerical model for calculating the charge profile and gate capacitance and therefore obtaining C-V characteristics of a gate-all-around III-V nanowire transistor with a high mobility In 0.53 Ga 0.47 As channel and …
crossref
Quazi D. M. Khosru, Saeed Uz Zaman Khan, Md. Shafayat Hossain, Fahim Ur Rahman 等
2013-05-02T22:48:31Z
置信度 0.78
physical sciencesoptoelectronicsmaterials sciencecond-mat.mes-hallphysics
-
crossref
Sung-Jin Choi, Dong-Il Moon, Sungho Kim, Jae-Hyuk Ahn 等
2011-04-15T23:56:13Z
置信度 0.63
-
crossref
Shubham Verma, Vimal Kumar Singh Yadav, Sanjeev Rai
2025-10-29T07:24:06Z
置信度 0.66
-
crossref
Y. Yue, J.J. Liou, I. Batarseh
2002-12-23T23:08:12Z
置信度 0.61
-
crossref
Young Jae Kim, Young Jun Yoon, Jae Hwa Seo, Sung Min Lee 等
2014-11-28T17:40:59Z
置信度 0.63
-
crossref
Dong Seup LEE, Hong-Seon YANG, Kwon-Chil KANG, Joung-Eob LEE 等
2010-05-06T06:03:15Z
置信度 0.61
-
crossref
Amir Hossein Bayani, Daryoosh Dideban, Mojtaba Akbarzadeh, Negin Moezi
2017-02-15T20:50:24Z
置信度 0.63