-
crossref
Jack C Lee, Katsunori Onishi
2004-11-26T05:04:02Z
置信度 0.61
-
This work presents a numerical simulation study of short-channel effect (SCE) in new hemispherical gate-all-around (HGAA) MOS devices. These new HGAA architectures enable the optimization of the gate-electrostatic control of simple GAA MOS devices after roundi…
crossref
Francis Balestra, Gerard Ghibaudo
2026-07-03T09:34:11Z
置信度 0.82
electrical engineering, electronic engineering, information engineeringmaterials sciencephysicscond-mat.mtrl-scicomputer and information sciences
-
crossref
Yung-Chun Wu, Yi-Ruei Jhan
2017-06-21T03:34:23Z
置信度 0.63
-
crossref
B. Bhowmick, K. Jena, S. Baishya
2014-10-22T20:11:39Z
置信度 0.63
-
crossref
Caleb Meriga, Ravi Teja Ponnuri, B. Vamsi Krishna, Shaik Ahmad Saidulu 等
2020-08-03T22:08:07Z
置信度 0.64
-
crossref
Pratikhya Raut, Umakanta Nanda
2021-08-18T23:36:46Z
置信度 0.64
-
crossref
Neel Chatterjee, Sujata Pandey
2016-04-20T03:26:53Z
置信度 0.63
-
crossref
Ya-Chi Huang, Meng-Hsueh Chiang, Shui-Jinn Wang
2016-10-10T12:07:03Z
置信度 0.63
-
In this work, we investigate the impact of Gallium Nitride (GaN) based Single Gate Tunnel field effect transistors (SG TFET) and Gate All Around (GAA) TFET by using analytical models. The models are derived by solving the 2D-Poisson’s equation and Parabolic Ap…
crossref
T.S.Arun Samuel, N. Arumugam, S.Theodore Chandra
2022-03-01T09:40:24Z
置信度 0.79
semiconductorconvolutional neural networkartificial neural networkcontrol theorytokamak
-
crossref
2023-05-23T07:40:26Z
置信度 0.64
-
crossref
Ru Huang
2013-03-02T02:38:17Z
置信度 0.63
-
DC/AC performances of 3-nm-node gate-all-around (GAA) FETs having different widths and the number of channels (Nch) from 1 to 5 were investigated thoroughly using fully-calibrated TCAD. There are two types of GAAFETs: nanowire (NW) FETs having the same width (…
crossref
Jun-Sik Yoon, Jinsu Jeong, Seunghwan Lee, Junjong Lee 等
2020-11-06T11:04:43Z
置信度 0.79
materials sciencecs.itai governancepetroleum engineeringoptics
-
crossref
Ankit Gaurav
2016-02-24T05:18:08Z
置信度 0.63
-
crossref
V.W.C. Chan, P.C.H. Chan
2002-11-07T20:32:49Z
置信度 0.61
-
crossref
Ritu Yadav, Kiran Ahuja
2023-06-25T00:47:53Z
置信度 0.64
-
crossref
Sayani Ghosh, Chandan K. Sarkar
2013-02-08T21:27:32Z
置信度 0.63
-
crossref
Sarabdeep Singh, Ashish Raman
2018-04-16T14:31:15Z
置信度 0.63
-
crossref
J.P. Colinge, M.H. Gao, A. Romano-Rodriguez, H. Maes 等
2002-12-04T22:06:48Z
置信度 0.61
-
crossref
2009-01-15T12:12:02Z
置信度 0.55
-
crossref
Tianli Duan
2019-10-03T07:01:23Z
置信度 0.64
-
crossref
Thierry Poiroux, Maud Vinet, Simon Deleonibus
2009-01-15T12:12:02Z
置信度 0.58
-
<span lang="EN-MY">Due to the rapid scaling of </span><span>Complementary Metal-Oxide-Semiconductor</span><span lang="EN-MY"> (CMOS), the structure of the planar MOSFET approaches the scaling limits when the short channel effects …
crossref
Nor Fareza Kosmani, Fatimah A.Hamid, M. Anas Razali
2019-01-26T15:08:01Z
置信度 0.79
cond-mat.mes-hallneuromorphic computinginformation theoryphysics.chem-phcond-mat.mtrl-sci
-
crossref
Rajni Gautam, Manoj Saxena, R. S. Gupta, Mridula Gupta
2013-08-02T14:01:00Z
置信度 0.63
-
crossref
M W Rony, Pankaj Bhowmik, Harley R. Myler, Provakar Mondol
2017-02-16T17:32:12Z
置信度 0.63
-
crossref
Mandeep Singh Narula, Archana Pandey
2022-01-20T13:02:44Z
置信度 0.64
-
crossref
Reddi Ganapati, Visweswara Rao Samoju, Bhaskara Rao Jammu
2020-08-31T13:28:29Z
置信度 0.64
-
crossref
Bhavya Kumar, Megha Sharma, Rishu Chaujar
2022-01-14T20:40:19Z
置信度 0.64
-
crossref
Sarabdeep Singh, Ashish Raman
2018-04-04T18:05:40Z
置信度 0.63
-
crossref
Vishwas Verma, Pawan Kumar Verma
2026-05-21T19:40:52Z
置信度 0.66
-
The need of miniaturization following Moore’s law has intensified research efforts on silicon nanostructures such as nanowires or nanoribbons that can be used as active part of electronic nano-devices. In this way, nanowires offer great potential as field effe…
crossref
Anne-Claire Salaun, Brice Le Borgne, Laurent Pichon
2020-02-27T13:07:36Z
置信度 0.79
materials sciencecomputer sciencephysical sciencescond-mat.mes-hallcond-mat.mtrl-sci
-
crossref
Krutideepa Bhol, Biswajit Jena, Umakanta Nanda, Shubham Tayal 等
2021-07-30T15:51:19Z
置信度 0.64
-
crossref
M. De Marchi, D. Sacchetto, S. Frache, J. Zhang 等
2013-03-20T21:31:24Z
置信度 0.63
-
crossref
J. P. Colinge
2012-07-29T00:25:55Z
置信度 0.63
-
Abstract The compact modeling of flash memories is crucial for integrated circuit designers to carry out efficient and precise circuit-level evaluations, particularly in the case of 3D NAND flash where the 3D geometry leads to significant parasitic coupling im…
crossref
Afiq Hamzah, N Ezaila Alias, Zaharah Johari, Michael Loong Peng Tan 等
2024-05-20T18:29:21Z
置信度 0.82
physics.comp-phcontrol theoryeess.syelectrical engineering, electronic engineering, information engineeringphysics.plasm-ph
-
crossref
C. C. M. Bordallo, V. B. Sivieri, J. A. Martino, P. G. D. Agopian 等
2016-03-24T16:22:07Z
置信度 0.63
-
Quantum-transport simulations of current-voltage characteristics are performed in ultra-small double-gate and gate-all-around metal-oxide-semiconductor field-effect-transistors (MOSFETs) with a single attractive ion in the channel region. The ion induces a thr…
crossref
Nobuya Mori, Yoshinari Kamakura, Genaddy Mil'nikov, Hideki Minari
2011-02-21T10:13:21Z
置信度 0.78
topological insulatorphysics.plasm-phplasma physicsq-bio.bminformation theory
-
crossref
Ajay, Mridula Gupta, Shashwat Bhattacharya, Sujata Pandey
2016-04-19T23:26:53Z
置信度 0.63
-
crossref
B. Padmanaban, R. Ramesh, D. Nirmal, S. Sathiyamoorthy
2015-02-16T12:35:17Z
置信度 0.63
-
crossref
Anushka Singh, Archana Pandey
2023-12-06T17:21:48Z
置信度 0.64
-
crossref
Victor Moroz
2023-03-22T17:51:55Z
置信度 0.64
-
crossref
M. Kessi, A. Benfdila, A. Lakhlef
2017-12-14T22:12:33Z
置信度 0.63
-
This report provides an overview of GAA FETs also known as Gate-All-Around FETs, focusing on their introduction and limitations, based on a comprehensive review of current literature and online resources. GAA FETs represent an evolution of FinFET technology, w…
crossref
Lecheng Pan
2026-01-25T00:19:46Z
置信度 0.82
materials scienceengineeringcomputer scienceelectrical engineering, electronic engineering, information engineeringcomputer and information sciences
-
crossref
Wei Hu, Feng Li
2021-07-26T21:03:41Z
置信度 0.64
-
crossref
Jae Sung Lee, Woo Young Choi, In Man Kang
2013-12-21T12:18:17Z
置信度 0.63
-
This report provides an overview of GAA FETs also known as Gate-All-Around FETs, focusing on their introduction and limitations, based on a comprehensive review of current literature and online resources. GAA FETs represent an evolution of FinFET technology, w…
crossref
Lecheng Pan
2024-10-29T19:52:05Z
置信度 0.82
materials scienceengineeringcomputer scienceelectrical engineering, electronic engineering, information engineeringcomputer and information sciences
-
crossref
Rafeek Alas, Kiran Bailey
2016-03-17T20:28:41Z
置信度 0.63
-
The paper proposes analytical model for Gate-All-Around Metal Oxide Semiconductor Field Effect Transistor (GAA-MOSFET) for germanium channel including quantum mechanical effects. It is achieved by solving coupled Schrodinger-Poisson’s equation using variationa…
crossref
P. Vimala, N.R. Nithin Kumar
2019-08-27T14:27:23Z
置信度 0.79
quantum dotquant-phcond-mat.mes-hallsemiconductorquantum
-
crossref
Mohammad Najmzadeh, Didier Bouvet, Wladek Grabinski, Adrian M. Ionescu
2011-09-21T16:17:53Z
置信度 0.63
-
crossref
Cita O,brain
2023-11-13T04:58:47Z
置信度 0.64
-
crossref
Hujun Jia, Wanli Yang, Weitao Cao, Linna Zhao 等
2024-08-31T03:42:44Z
置信度 0.66
-
crossref
Asmita Menaria, Rahul Pandey, Ramesh Kumar
2020-06-03T21:15:33Z
置信度 0.64
-
crossref
S.-H. Lee, S. Dey, S V. Joshi, P. Majhi 等
2007-11-06T15:40:09Z
置信度 0.61
-
crossref
S. Kolberg, H. Børli, T.A. Fjeldly
2007-10-01T18:00:10Z
置信度 0.61
-
crossref
Lining Zhang, Chenyue Ma, Jin He, Xinnan Lin 等
2010-04-21T04:44:50Z
置信度 0.61
-
crossref
Han-Wei Hsiao, Yuh-Renn Wu
2018-10-08T05:50:26Z
置信度 0.63
-
crossref
Renhua Liu, Xiaojin Li, Yabin Sun, Yanling Shi
2020-05-04T23:54:12Z
置信度 0.64
-
crossref
D. Boudier, B. Cretu, E. Simoen, A. Veloso 等
2017-07-25T21:38:00Z
置信度 0.63
-
In this paper, gate-all-around (GAA) tunneling field-effect transistors (TFETs) with hetero-gate dielectric (HG) materials have been simulated and their characteristics have been optimized as a function of the high- k dielectric length ( L high k ). For the op…
crossref
Jae Sung Lee, Woo Young Choi, In Man Kang
2012-06-20T01:33:10Z
置信度 0.78
materials sciencesemiconductornanotechnologybiologyphysics.app-ph
-
crossref
Amol D. Gaidhane, Girish Pahwa, Amit Verma, Yogesh Singh Chauhan
2018-03-21T14:04:49Z
置信度 0.63
-
In the post-Moore era, the three-dimensional fully surrounded channel structure of gate-all-around field-effect transistors (GAAFETs) significantly enhances gate control capabilities. However, its nanoscale features lead to severe overall self-heating effects …
crossref
Zhe Liu, Bo Hua Sun, Hai Hang Cui, Kai Sun
2025-02-07T09:39:36Z
置信度 0.82
materials sciencecond-mat.mtrl-sciphysics.comp-phsemiconductorcond-mat.mes-hall
-
crossref
Dheeraj Sharma, Santosh Kumar Vishvakarma
2012-03-06T12:15:40Z
置信度 0.63
-
crossref
B Jena, B S Ramkrishna, S Dash, G P Mishra
2016-02-12T09:14:06Z
置信度 0.63
-
crossref
Jae Hwa Seo, Young Jun Yoon, Young-Woo Jo, Dong-Hyeok Son 等
2016-08-20T15:59:39Z
置信度 0.63
-
crossref
Raymond Chow
2018-10-04T20:10:16Z
置信度 0.63
-
crossref
Rishu Chaujar, Mekonnen Getnet Yirak
2024-06-18T01:02:32Z
置信度 0.66
-
The high demand for low-power data processing in AI chips has necessitated the development of high-performance transistors. To suppress the critical drain-induced barrier lowering (DIBL) effect in gate-all-around field-effect transistors (GAAFETs), this paper …
crossref
Zirou Ji
2026-06-01T07:16:44Z
置信度 0.82
physical sciencesai governanceai safetycorporate governanceknowledge management
-
crossref
Krutideepa Bhol, Biswajit Jena, Umakanta Nanda
2020-07-29T14:20:17Z
置信度 0.64
-
The IEEE International Roadmap for Devices and Systems (IRDS) for More Moore devices summarises the Logic Device state of play very effectively; the FinFET is the key device architecture that could enable logic device scaling until 2025. Increasing fin height …
crossref
Ray Duffy
2021-07-16T18:58:45Z
置信度 0.79
materials sciencesemiconductorcond-mat.mtrl-scinanotechnologyphysics.app-ph
-
<p>An analytical subthreshold swing (SS) model has been presented to determine the SS of an elliptic junctionless gate-all-around field-effect transistor (GAA FET). The analysis of a GAA FET with an elliptic cross-section is essential because it is diffi…
crossref
Hakkee Jung
2024-04-15T11:24:13Z
置信度 0.82
climatologymotor imageryinternal medicinecontrol theoryastrophysics
-
crossref
A. Vandooren, P. Francis, D. Flandre, J.-P. Colinge
2002-11-23T01:47:57Z
置信度 0.61
-
Abstract In the research paper, the semi-analytical modelling is done for low drain-induced barrier lowering (DIBL) dual-metal gate all around FET (DM GAAFET). Vacuum and silicon nitride are considered in the act of the gate oxide material near drain region fo…
crossref
Amit Kumar, Anil Kumar Rajput, Manisha Pattanaik, Pankaj Srivast
2021-06-03T14:40:36Z
置信度 0.79
semiconductoroptoelectronicsphysics.app-phelectrical engineering, electronic engineering, information engineeringphysical sciences
-
crossref
Navjeet Bagga, S. Dasgupta
2017-10-25T15:19:03Z
置信度 0.63
-
crossref
Vaibhav Purwar, Rajeev Gupta, Himanshi Awasthi, Sarvesh Dubey
2022-01-27T00:03:36Z
置信度 0.64
-
crossref
Jin Yong Oh, M. Saif Islam
2014-01-17T15:50:40Z
置信度 0.63
-
crossref
Arvind Ganesh, Kshitij Goel, Jaskeerat Singh Mayall, Sonam Rewari
2021-06-09T19:03:07Z
置信度 0.64
-
crossref
Salman Saleem, P Vimala
2022-06-16T19:38:00Z
置信度 0.64
-
crossref
Supriya Karmakar
2013-11-20T10:17:51Z
置信度 0.63
-
crossref
Suman Sharma, Rajni Shukla
2016-02-15T12:37:39Z
置信度 0.63
-
crossref
Lining Zhang, Chenyue Ma, Jin He, Xinnan Lin 等
2010-07-07T08:52:15Z
置信度 0.61
-
crossref
Manoj Kumar, Mridula Gupta, Subhasis Haldar, R.S. Gupta
2015-10-01T18:05:50Z
置信度 0.63
-
crossref
Rashmi Gupta, Neeraj Gupta, Arun Kumar Singh, Prashant Kumar 等
2025-05-29T17:06:14Z
置信度 0.66
-
crossref
Tsung-Kuei Kang, Ta-Chuan Liao, Chun-Kai Wang
2012-05-31T18:40:47Z
置信度 0.63
-
crossref
Leo Raj Solay, Sunny Anand, S. Intekhab Amin, Pradeep Kumar
2022-02-03T20:30:23Z
置信度 0.64
-
crossref
Weihong Yang, Jun Li, Peijin Huang, Simon Ogier 等
2026-01-30T21:00:04Z
置信度 0.66
-
crossref
B. Iniguez, T.A. Fjeldly, A. Lazaro, F. Danneville 等
2006-08-23T15:36:32Z
置信度 0.61
-
crossref
Nazmul Hasan Naime, Afsana Anjum Akhi, Mainul Hossain
2025-04-04T16:50:27Z
置信度 0.66
-
crossref
Rajni Gautam, Manoj Saxena, R. S. Gupta, Mridula Gupta
2012-09-19T14:12:14Z
置信度 0.63
-
Effects of interface roughness on the threshold-voltage variation of nanometer-size gate-all-around (GAA) and double-gate (DG) metal–oxide–semiconductor field-effect transistors (MOSFETs) are investigated using three-dimensional non-equilibrium Green's functio…
crossref
Nobuya Mori, Hideki Minari
2010-04-20T01:58:00Z
置信度 0.75
physics.plasm-phmineralogycondensed matter physicssystems and controltopological insulator
-
crossref
Shaodi Wang, Xinjie Guo, Lining Zhang, Chenfei Zhang 等
2011-02-15T21:12:43Z
置信度 0.63
-
crossref
Anubha Goel, R. S. Gupta
2023-02-16T23:01:47Z
置信度 0.64
-
crossref
Rainer Kassing
2018-04-13T05:52:02Z
置信度 0.63
-
crossref
Chengwu Tao
2018-08-10T15:38:27Z
置信度 0.63
-
crossref
2025-07-10T13:01:12Z
置信度 0.66
-
crossref
X. Baie, J.P. Colinge
2002-07-25T13:28:40Z
置信度 0.61
-
crossref
Princy Sharma, Subindu Kumar
2026-01-19T20:51:22Z
置信度 0.66
-
crossref
Amit Agarwal, P C Pradhan, Bibhu P Swain
2019-12-03T08:03:24Z
置信度 0.64
-
High performance Ge inversion (INV) and junctionless (JL) GAAFETs are demonstrated. The (111) sidewall-enhanced Ge GAA nFETs show 2x enhanced I on of 110 mA/mm at 1V with respect to the devices with near (110) sidewalls and subthreshold characteristics of 94 m…
crossref
C. W. Liu, Yen-Ting Chen, Shu-Han Hsu
2014-09-30T16:56:20Z
置信度 0.78
wearable computercond-mat.mes-halloptoelectronicsedge computingai safety
-
crossref
Chen Zhang, Wonsik Choi, Parsian Mohseni, Xiuling Li
2015-08-12T18:37:34Z
置信度 0.63
-
crossref
P. Francis, X. Baie, J. P. Colinge
2015-11-06T07:19:13Z
置信度 0.63
-
crossref
Faouzi Nasri, Husien Salama
2024-03-04T14:00:33Z
置信度 0.66